Shared Read/Write Line in Vertical 2T Memory Cells for Dense Arrays

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Solution Overview

Problem

Conventional volatile memory devices face challenges in reducing memory cell size to increase storage density due to physical limitations and fabrication constraints, leading to inefficiencies in storing and retrieving data.

Innovation Solution

The implementation of a 2T memory cell structure with a charge storage structure, where two transistors are stacked vertically, allowing for a smaller footprint and efficient data storage and retrieval through controlled voltage operations.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Area of stationary object

If conventional memory cell structures are used to increase storage density, then the device area is reduced, but physical limitations and fabrication constraints prevent further shrinking

Engineering Contradiction:
Improvememory cell areaVSAvoidfabrication constraint
Core Design Contradiction:
Area of stationary objectVSManufacturing precision

Solution Approach 1:

The patent transitions from planar memory cell layout to a vertical three-dimensional structure where bit lines extend in the Z-direction through multiple decks of memory cells. This dimensional change allows continued scaling of storage density without further reducing the planar footprint, overcoming fabrication constraints while maintaining manufacturability.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Quantity of substance

If memory cell size is reduced to increase storage density, then device storage density increases, but data retention and access reliability deteriorate

Engineering Contradiction:
Improvestorage densityVSAvoiddata retention
Core Design Contradiction:
Quantity of substanceVSReliability

Solution Approach 1:

By stacking multiple decks of memory cells vertically along the Z-axis, the patent achieves high storage density without compressing the lateral dimensions. Each memory cell maintains its full operational characteristics including charge storage capacity and transistor performance, ensuring data retention reliability is preserved while achieving increased storage density through vertical expansion.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

The memory device is divided into multiple independent decks, each containing complete memory cells with charge storage structures. This segmentation allows each deck to operate independently with full data retention capabilities, preventing the reliability degradation that would result from further lateral miniaturization while achieving high density through vertical stacking.

Inventive Principle:
Principle #1Segmentation

3Ease of operation

If conventional access line structures are used, then read/write operations are simple, but access time increases due to longer signal paths

Engineering Contradiction:
Improveaccess operation simplicityVSAvoidaccess time
Core Design Contradiction:
Ease of operationVSLoss of time

Solution Approach 1:

Bit lines are configured to extend vertically in the Z-direction through multiple decks of memory cells, enabling direct vertical access to all memory cells across different decks. This vertical routing eliminates the need for complex lateral signal routing and reduces the effective signal path length, thereby decreasing access time while maintaining operational simplicity through direct vertical addressing.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Data Source

PatentUS11942136B2Memory device having shared read/write access line for 2-transistor vertical memory cell
Publication Date: 2024.03.26 MICRON TECHNOLOGY INC
  • US11942136B2 patent drawing
  • US11942136B2 patent drawing
  • US11942136B2 patent drawing

AI summary

Some embodiments include apparatuses and methods operating the apparatuses. One of the apparatuses includes a first data line located over a substrate, a second data line located over the first data line, a third data line located over the second data line and electrically separated from the first and second data lines, and a memory cell coupled to the first, second, and third data lines. The memory cell includes a first material between the first and second data lines and electrically coupled to the first and second data lines; a second material located over the first data line and the first material, the second material electrically separated from the first material and electrically coupled to the third data line; and a memory element electrically coupled to the second material and electrically separated from the first material and first and second data lines.