Shared Select Gates for Memory Cell Density

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Solution Overview

Problem

As memory cell density increases for a given device area, producing memory devices that meet performance preferences becomes challenging due to the complexity of managing select gates and transistors in memory arrays.

Innovation Solution

The implementation of memory devices with shared select gates, such as shared bottom source select gates or shared top drain select gates, allows for efficient coupling and decoupling of memory cell strings during read or write operations, improving memory cell density by reducing leakage current and enhancing the on-to-off current ratio.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Quantity of substance

If memory cell density is increased for a given device area, then more memory cells can be stored, but performance preferences become difficult to meet due to complexity of managing select gates and transistors

Engineering Contradiction:
Improvememory cell densityVSAvoidcomplexity of managing select gates and transistors
Core Design Contradiction:
Quantity of substanceVSDevice complexity

Solution Approach 1:

Multiple select transistors share a common gate structure, merging control functions to reduce the number of independent gate management circuits. This allows higher memory cell density while reducing the complexity overhead associated with managing individual select gates for each transistor.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The common gate structure serves multiple select transistors simultaneously, making it a universal control element that manages multiple memory cell strings. This multi-functionality reduces the overall complexity of gate management while enabling increased memory cell density.

Inventive Principle:
Principle #6Universality (Multi-functionality)

2Quantity of substance

If more memory cells are coupled to each data line, then memory cell density increases, but leakage current management becomes more challenging

Engineering Contradiction:
Improvememory cell densityVSAvoidleakage current
Core Design Contradiction:
Quantity of substanceVSObject-generated harmful factors

Solution Approach 1:

Multiple select transistors share a common gate, merging their control functions. This reduces the total number of gate structures and associated leakage paths, allowing more memory cells to be coupled to each data line while managing leakage current effectively.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The patent extracts and eliminates redundant gate structures by implementing shared gates. This removal of unnecessary components reduces leakage current while maintaining the ability to couple more memory cells to each data line.

Inventive Principle:
Principle #2Taking out (Extraction)

Data Source

PatentUS9711514B2Methods and apparatuses including a select transistor having a body region including monocrystalline semiconductor material and/or at least a portion of its gate located in a substrate
Publication Date: 2017.07.18 MICRON TECHNOLOGY INC
  • US9711514B2 patent drawing
  • US9711514B2 patent drawing
  • US9711514B2 patent drawing

AI summary

Some embodiments include apparatuses and methods having a memory cell string including memory cells located in different levels of the apparatuses and a select transistor coupled to the memory cell string. In at least one of such apparatuses, the select transistor can include a body region including a monocrystalline semiconductor material. Other embodiments including additional apparatuses and methods are described.