Shielding Pad for Planarization Device Substrate Scraping

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Solution Overview

Problem

In planarization processes, large crystallized particles from the slurry can easily drop onto the grinding pad and scrape the substrate, leading to inefficiencies and increased maintenance costs.

Innovation Solution

A planarization device equipped with a shielding pad on the operation arm, made from anti-corrosive materials like polypropylene, which prevents slurry pollution and allows for easy replacement of oversized crystallized particles, reducing the risk of substrate scraping.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If slurry is used during planarization, then planarization can be performed, but solid particles in the slurry crystallize into large particles that can scrape the substrate

Engineering Contradiction:

Improveplanarization capabilityVSAvoidsubstrate scraping

Core Design Contradiction:

ProductivityVSObject-affected harmful factors

Solution Approach 1:

The shielding pad acts as an intermediary component between the operation arm and the substrate, intercepting crystallized particles before they can reach and scrape the substrate. This mediator absorbs the harmful effect without compromising the planarization function.

Inventive Principle:

Principle #24Intermediary (Mediator)

Solution Approach 2:

The shielding pad is designed as a replaceable, cost-effective component that can be easily replaced when contaminated with crystallized particles. This disposable approach is more economical than replacing damaged substrates or performing complex cleaning operations.

Inventive Principle:

Principle #27Cheap short-living objects (Disposable)

2Reliability

If crystallized particles accumulate on the operation arm, then they may drop to the grinding pad, but removing them requires device stoppage and maintenance

Engineering Contradiction:

Improvecontinuous operationVSAvoidparticle removal

Core Design Contradiction:

ReliabilityVSEase of repair

Solution Approach 1:

The shielding pad serves as a removable intermediary that can be quickly detached and replaced without stopping the planarization device. This separates the maintenance function from the operation function, allowing continuous production.

Inventive Principle:

Principle #24Intermediary (Mediator)

Solution Approach 2:

The shielding pad is designed as a separate, modular component that can be independently replaced without affecting other parts of the device. This segmentation enables rapid maintenance while keeping the rest of the system operational.

Inventive Principle:

Principle #1Segmentation

3Device complexity

If no shielding is provided, then the device structure remains simple, but slurry pollution affects the operation arm and substrate

Engineering Contradiction:

Improvedevice structureVSAvoidslurry pollution

Core Design Contradiction:

Device complexityVSObject-affected harmful factors

Solution Approach 1:

The shielding pad is a simple intermediary component that effectively blocks slurry and crystallized particles from contaminating the operation arm and substrate, adding minimal complexity while providing substantial protection.

Inventive Principle:

Principle #24Intermediary (Mediator)

Solution Approach 2:

The shielding pad uses a thin, flexible protective layer that provides effective shielding against slurry pollution without adding significant structural complexity or weight to the device.

Inventive Principle:

Principle #30Flexible shells and thin films

Data Source

PatentUS9434045B2Planarization device and planarization method using the same

Publication Date: 2016.09.06 MACRONIX INTERNATIONAL CO LTD

AI summary

A planarization device and a planarization method using the same are provided. The planarization device comprises a platen, a grinding pad, an operation arm, a chuck and a shielding pad. The grinding pad is disposed on the platen. The operation arm has a lower surface. The chuck rotatably is disposed on the operation arm. The shielding pad is detachably disposed on the lower surface of the operation arm.