Shower Head Hole Zoning to Prevent Plasma Edge Arcing

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Solution Overview

Problem

Arcing occurs in the through holes of shower heads during plasma-enhanced chemical vapor deposition (PECVD) and plasma-enhanced etching processes due to charge accumulation at the edges, leading to contamination, electrical damage, and frequent replacement of shower heads.

Innovation Solution

A modified shower head structure with a plurality of second through holes near the edge, having reduced diameters compared to the first through holes in the central region, which reduces the distance between sheath layers and prevents plasma stability, thereby minimizing arcing.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Area of stationary object

If through holes are located near the edge of the shower head, then gas distribution coverage is improved, but charge accumulation occurs leading to arcing

Engineering Contradiction:
Improvegas distribution coverage areaVSAvoidarcing
Core Design Contradiction:
Area of stationary objectVSObject-affected harmful factors

Solution Approach 1:

The patent applies local quality by differentiating the characteristics of through holes based on their location. Edge through holes are designed with smaller diameters compared to central through holes, creating non-uniform local properties that prevent charge accumulation at edges while maintaining effective gas distribution coverage across the substrate area.

Inventive Principle:
Principle #3Local quality

2Reliability

If through hole diameter is reduced at edges, then arcing is prevented, but gas flow uniformity may be affected

Engineering Contradiction:
Improvearcing preventionVSAvoidgas flow uniformity
Core Design Contradiction:
ReliabilityVSStability of the object's composition

Solution Approach 1:

The patent changes the parameter of through hole diameter based on spatial location. By reducing the diameter parameter specifically for edge through holes while maintaining larger diameters in the central region, the invention achieves arcing prevention through modified electrical characteristics while the overall gas flow uniformity is maintained through the distributed pattern of holes across different zones.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The modified shower head structure effectively prevents arcing in PECVD and plasma-enhanced etching processes, extending the lifetime of the shower head, reducing downtime, and maintaining process integrity without altering existing PECVD or plasma-enhanced etching parameters.

Implementation Method 1

reduces the distance between sheath layers and prevents plasma stability, thereby minimizing arcing

Methodology Applied
Scientific EffectSheath layer:

Data Source

PatentUS12215422B2Shower head structure and plasma processing apparatus using the same
Publication Date: 2025.02.04 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US12215422B2 patent drawing
  • US12215422B2 patent drawing
  • US12215422B2 patent drawing

AI summary

A shower head structure and a plasma processing apparatus are provided. The shower head structure includes a plate body with a first zone and a second zone on a first surface. A plurality of first through holes are in the first zone, each of the first through holes having a diameter uniform with others of the first through holes. A plurality of second through holes are in the second zone. The first zone is in connection with the second zone, and the diameter of each of the first through holes is greater than a diameter of each of the second through holes. A plasma processing apparatus includes the shower head structure is also provided.