Showerhead Gas Segmentation for CVD Thermal Deformation
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Solution Overview
Problem
Thermal deformation in display devices during chemical vapor deposition (CVD) processes leads to defects in thin film formation, particularly in liquid crystal and organic light emitting display devices, which affects the quality and reliability of the displays.
Innovation Solution
A thin film processing apparatus with a showerhead design featuring a single plate with an inner tunnel and separate injection holes for reaction gases, ensuring they do not mix until reaching the reaction space, and a susceptor for temperature control, which reduces thermal deformation and defects by maintaining uniform gas distribution and preventing gas mixing within the showerhead.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If chemical vapor deposition (CVD) method is used for manufacturing display devices, then thin film formation is achieved, but thermal deformation occurs in the display device
Solution Approach 1:
The showerhead is divided into multiple independent gas injection channels (first injection hole, second injection hole) that separately deliver different reaction gases. This segmentation prevents gas mixing within the showerhead structure, ensuring uniform gas distribution to the substrate and reducing thermal deformation during CVD processing.
Solution Approach 2:
Different regions of the showerhead are designed with specific functions: the first injection hole delivers one reaction gas while the second injection hole delivers another reaction gas. This local differentiation ensures optimal gas distribution across different areas of the substrate, maintaining uniform temperature and preventing thermal deformation.
2Device complexity
If reaction gases are injected through a single mixed channel, then gas delivery is simplified, but gas mixing occurs before reaching the reaction space causing defects
Solution Approach 1:
The gas delivery system is segmented into separate injection holes within the showerhead, allowing different reaction gases to be delivered independently without mixing. This maintains manufacturing precision by ensuring controlled gas reactions at the substrate surface while the showerhead structure remains relatively simple with just multiple holes in a single plate.
3Object-affected harmful factors
If uniform gas distribution is achieved through multiple injection holes, then thermal deformation is reduced, but the showerhead structure becomes more complex
Solution Approach 1:
The showerhead uses a simple segmented structure with multiple independent injection holes in a single plate, achieving uniform gas distribution without complex internal channels or mixing chambers. This reduces thermal deformation while maintaining structural simplicity.
Solution Approach 2:
Instead of mixing gases in a central chamber and then distributing them, the invention inverts the approach by delivering separate gas streams through independent holes directly to the substrate. This simplifies the showerhead structure while achieving the desired uniform gas distribution and reducing thermal deformation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively reduces thermal deformation and defects in thin film processing, enabling the formation of high-quality metal oxide films with high dielectric constants, enhancing the performance and reliability of display devices.
Implementation Method 1
A first reaction gas and a second reaction gas are injected into a reaction space between the susceptor and the showerhead through the showerhead. The first reaction gas and the second reaction gas do not come into contact with each other in the showerhead.
Implementation Method 2
a susceptor and a showerhead facing the susceptor
Implementation Method 3
As a method of manufacturing a display device, a chemical vapor deposition (CVD) method may be used
Data Source
AI summary
A thin film processing apparatus includes a susceptor and a showerhead facing the susceptor. The showerhead includes a first plate including an inner tunnel, a first injection hole, and a second injection hole. The inner tunnel extends across the first plate in a thickness direction of the first plate. The first injection hole penetrates a first surface and a second surface of the first plate on opposite sides of the first plate in the thickness direction. The second injection hole penetrates the second surface of the first plate. The second injection is connected with the inner tunnel.