Showerhead Porous Insert Reduces Backside Plasma Ignition
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Solution Overview
Problem
Existing showerhead assemblies in semiconductor processing chambers experience backside plasma ignition, leading to discoloration, polymer deposition, and contamination due to high RF electric fields, which causes bond seal erosion and particle issues.
Innovation Solution
A showerhead assembly with a porous insert located between the gas distribution plate and the base plate, which moderates corrosive radicals and reduces electrical field strength, preventing plasma ignition and contamination.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If higher RF power is applied to the showerhead assembly, then processing productivity is improved, but backside plasma ignition occurs causing contamination and particle issues
Solution Approach 1:
A porous insert material is introduced as an intermediary component between the gas distribution plate and the base plate. This insert acts as a mediator that absorbs corrosive radicals and moderates the electrical field, preventing direct harmful interactions while allowing the system to operate at higher RF powers for improved productivity
Solution Approach 2:
The patent employs a porous insert material with specific pore structures that enable it to absorb corrosive radicals generated during plasma processing. The porous structure provides increased surface area for radical absorption and allows controlled gas flow while preventing particle generation from backside plasma ignition
2Device complexity
If the gap between gas distribution plate and base plate is reduced, then device complexity is reduced, but plasma ignition risk increases
Solution Approach 1:
The porous insert material is specifically designed to function in reduced gap configurations. Its porous structure allows it to effectively absorb corrosive radicals even in compact spaces, enabling reduced device complexity while maintaining reliability by preventing plasma ignition through radical absorption and field moderation
3Productivity
If the showerhead assembly is operated at higher power levels, then processing efficiency is improved, but bond seal erosion and gasket seal erosion occur
Solution Approach 1:
The porous insert serves as a protective intermediary that absorbs corrosive radicals before they can reach and erode the bond seals and gasket seals. This mediator function allows the showerhead assembly to operate at higher power levels for improved processing efficiency while protecting the sealing components from chemical attack
Solution Approach 2:
The porous insert provides beforehand cushioning by being positioned upstream in the radical transport path. It absorbs corrosive radicals in advance, creating a protective effect that prevents subsequent erosion of vulnerable components like bond seals and gasket seals during high-power operation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The porous insert effectively reduces and eliminates backside plasma ignition, decreases particle contamination, and extends the service interval of the processing chamber by minimizing the need for cleaning, while maintaining performance at higher power levels.
Implementation Method 1
The porous insert may be a conductive material, such as metal, used to moderate the corrosive radicals resulting from plasma ignition
Implementation Method 2
The porous insert may be a conductive material, such as metal, used to moderate the corrosive radicals resulting from plasma ignition
Data Source
AI summary
Embodiments of the present disclosure relate to a showerhead assembly for use in a processing chamber. The showerhead assembly includes a porous insert disposed in a space defined between a gas distribution plate and a base plate to moderate the corrosive radicals resulting from plasma ignition to reduce particle issues and metal contamination in the chamber. The porous insert is a conductive material, such as metal, used to reduce the gap electrical field strength, or may be a dielectric material such as ceramic, polytetrafluoroethylene, polyamide-imide, or other materials with a low dielectric loss and high electrical field strength under conditions of high frequency and strong electric fields. As such, the electrical breakdown threshold is enhanced. The porous insert may reduce and/or eliminate showerhead backside plasma ignition and may include multiple concentric narrow rings that cover gas holes of the gas distribution plate.


