Shutter-Based EPD Integration for Legacy OES Systems
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Solution Overview
Problem
Integration of new end-point determination (EPD) systems into semiconductor processing tools is challenging due to proprietary communication protocols and lack of compatibility with legacy systems, leading to difficulties in achieving accurate and reliable end-point control.
Innovation Solution
A second EPD system controls a shutter to create an artificial end-point condition, triggering the legacy OES EPD system to call end-point by regulating light intensity between a plasma light source and an optical emission spectroscopy sensor, allowing the new system to actively control end-pointing without modifying the tool's hardware.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a new EPD system is integrated into a semiconductor processing tool, then measurement precision and reliability of end-point determination are improved, but device complexity and integration difficulty increase due to proprietary communication protocols
Solution Approach 1:
The patent introduces a shutter as an intermediary component between the new EPD system and the legacy OES system. The shutter controls light transmission to the OES sensor, enabling the new system to trigger end-point detection in the legacy system without requiring direct communication protocol integration. This mediator approach bypasses the proprietary protocol barrier while achieving functional integration.
Solution Approach 2:
The patent creates an artificial copy of the end-point condition by using the shutter to simulate the optical signal changes that would normally occur during plasma processing. Instead of directly communicating with the legacy system, the new EPD system replicates the end-point signal through optical manipulation, allowing the legacy system to detect the end-point without understanding the underlying control mechanism.
2Ease of operation
If the legacy OES EPD system is used, then ease of operation and compatibility are maintained, but measurement precision and accuracy of end-point determination are insufficient
Solution Approach 1:
The patent merges the advantages of both systems by combining the new EPD system's accurate end-point detection algorithms with the legacy OES system's established communication infrastructure. The shutter mechanism allows the two systems to work together, with the new system providing precise control logic and the legacy system providing reliable integration with the processing tool.
Solution Approach 2:
The shutter serves as a mediator that allows the new EPD system to control the legacy OES system without requiring modifications to either system's core architecture. This maintains the legacy system's ease of operation while enabling it to be controlled by the more accurate new EPD system.
3Adaptability or versatility
If conventional integration approaches are used (reverse-engineering protocols or using SECS ports), then adaptability to new EPD systems is attempted, but ease of operation deteriorates due to manual intervention requirements or protocol interpretation difficulties
Solution Approach 1:
The patent replaces complex communication protocol interactions with a simple mechanical/optical system - the shutter. Instead of dealing with proprietary binary protocols or SECS command sequences, the integration is achieved through physical light blocking, which is universally understood by optical detection systems and requires no protocol interpretation.
Solution Approach 2:
The shutter acts as a universal intermediary that translates electronic control signals into optical effects that the legacy OES system can detect. This approach provides adaptability to different new EPD systems while maintaining operational simplicity, as the shutter control mechanism remains consistent regardless of the specific new EPD system used.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables accurate and reliable end-point determination by leveraging existing legacy systems, allowing for flexible integration of new EPD systems without disrupting the operation of legacy components, thus improving process control and adaptability in semiconductor manufacturing.
Implementation Method 1
a second end-point determination (EPD) system controls a shutter that regulates the amount of light transmitted between a plasma light source and an optical emission spectroscopy (OES) sensor of the legacy OES EPD system
Data Source
AI summary
Embodiments in accordance with the present invention allow a second end-point determination (EPD) system to actively control the end-pointing of a semiconductor process chamber, by leveraging a legacy EPD system that is already integrated with the chamber. In one embodiment, the second EPD system controls a shutter that regulates the amount of light transmitted between a plasma light source and an optical emission spectroscopy (OES) sensor of the legacy OES EPD system. In this embodiment, the legacy OES EPD system is pre-configured to call end-point when an artificial end-point condition occurs, i.e. the intensity of light falls below a pre-set threshold. When the second EPD system determines an actual end-point condition has been reached, it closes the shutter which, causes the light intensity being read by the OES sensor to fall below the pre-set threshold. This in turn triggers an end-point command to the chamber from the legacy OES EPD system.