Si-Block Copolymer Phase Separation with Neutral Top Coat
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Solution Overview
Problem
The existing methods for forming fine patterns using phase-separated structures of block copolymers often damage the guide patterns due to the application of block copolymer solutions or top coat materials, which contain basic substances that can harm the guide patterns during processing.
Innovation Solution
A method is developed that forms a phase-separated structure by creating a layer with an Si-containing block copolymer between guide patterns on a substrate, applying a top coat material without basic substances, and subjecting it to annealing, thereby minimizing damage to the guide patterns during the phase separation process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a block copolymer solution or top coat solution is applied to the guide pattern, then the phase-separated structure can be formed, but the guide pattern is likely to be damaged
Solution Approach 1:
The patent introduces a neutralization film as an intermediary layer between the guide pattern and the block copolymer solution. This film acts as a protective mediator that prevents direct contact between the basic block copolymer solution and the guide pattern, thereby eliminating the harmful effect while allowing the phase-separated structure to form on top of the neutralization film.
Solution Approach 2:
The neutralization film is formed beforehand on the substrate before applying the guide pattern and block copolymer solution. This pre-formed protective layer provides cushioning protection against the basic substances in the block copolymer solution, preventing damage to the guide pattern before the harmful interaction can occur.
2Manufacturing precision
If a negative-tone developing process is used to form the guide pattern, then the guide pattern can be formed with desired precision, but the guide pattern becomes more susceptible to damage from basic substances
Solution Approach 1:
The neutralization film serves as a protective intermediary that allows the guide pattern to be formed with high precision using negative-tone developing while protecting it from subsequent damage by basic substances in the block copolymer solution.
Solution Approach 2:
The neutralization film acts as a disposable protective layer that can be easily formed and removed or left as part of the final structure, providing reliable protection to the guide pattern without compromising its precision or integrity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method effectively forms a phase-separated structure while protecting the guide patterns from damage, ensuring precise control over the phase separation and pattern formation without compromising the integrity of the guide patterns.
Implementation Method 1
the layer including the Si-containing block copolymer having the top coat film formed thereon is subjected to annealing treatment so as to conduct a phase separation of the layer
Implementation Method 2
the layer including the Si-containing block copolymer having the top coat film formed thereon is subjected to annealing treatment so as to conduct a phase separation of the layer
Implementation Method 3
a fine pattern is formed using a phase-separated structure formed by self-assembly of a block copolymer having mutually incompatible blocks bonded together
Data Source
AI summary
A method of producing a structure containing a phase-separated structure, including a step in which a layer including an Si-containing block copolymer having a plurality of blocks bonded is formed between guide patterns on a substrate; a step in which a solution of a top coat material is applied to the layer and the guide patterns so as to form a top coat film; and a step in which the layer including the Si-containing block copolymer and having the top coat film formed thereon is subjected to annealing treatment so as to conduct a phase separation of the layer; in which a solvent of the solution of the top coat material contains no basic substance.