Symmetry-Breaking Silicon Surface Corrugations for Light Trapping

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Solution Overview

Problem

The efficiency of crystalline silicon (c-Si) solar cells is limited by their high cost due to thick wafers and weak light absorption, necessitating the development of methods to introduce symmetry-breaking surface corrugations for improved light trapping in thin films.

Innovation Solution

A method involving the fabrication of nanopatterned surfaces with symmetry-breaking corrugations using wet etching on crystalline silicon substrates, creating inverted nanopyramid arrays with varying symmetries (C4v, C4, C2, and C1) to enhance light trapping, eliminating the need for metal nanostructures and reducing costs.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Use of energy by moving object

If thick c-Si wafers are used to achieve sufficient light absorption, then light absorption is improved, but manufacturing cost increases

Engineering Contradiction:
Improvelight absorptionVSAvoidwafer thickness
Core Design Contradiction:
Use of energy by moving objectVSQuantity of substance

Solution Approach 1:

The patent applies asymmetry by introducing symmetry-breaking surface corrugations to the silicon substrate. These corrugations create asymmetric optical paths that enhance light trapping and absorption in thin films, allowing thin c-Si wafers to achieve light absorption levels comparable to much thicker wafers, thereby reducing material costs while maintaining efficiency

Inventive Principle:
Principle #4Asymmetry

Solution Approach 2:

The patent transitions from considering only the thickness dimension to incorporating surface topology dimensions. By creating nanoscale corrugations and textures on the surface, the patent adds optical path length in the lateral dimensions, enabling thin films to trap light more effectively without increasing wafer thickness

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Use of energy by moving object

If metal nanostructures are used for light scattering, then light trapping is improved, but manufacturing cost and metal loss increase

Engineering Contradiction:
Improvelight trappingVSAvoidmetal usage
Core Design Contradiction:
Use of energy by moving objectVSQuantity of substance

Solution Approach 1:

The patent extracts the light scattering function from metal nanostructures and implements it using native silicon surface corrugations. By removing the metal component and using only silicon-based structures with asymmetric surface textures, the patent achieves light trapping without metal loss or the need for expensive metal nanostructure fabrication

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent uses homogeneous silicon material for both the substrate and the light-trapping structures. The symmetry-breaking corrugations are formed directly in the silicon, creating a uniform material composition that eliminates the need for heterogenous metal nanostructures while maintaining effective light scattering and trapping

Inventive Principle:
Principle #33Homogeneity

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach increases the surface area and light absorption in thin-film solar cells, achieving comparable efficiency to thick c-Si films while reducing material costs and metal loss, with potential applications in photovoltaics and optomechanical systems.

Implementation Method 1

The patterning the substrate may include anisotropically removing portions of the substrate exposed by the plurality of spaces

Methodology Applied
Scientific EffectAnisotropic etching:

Data Source

PatentUS10483415B2Methods to introduce sub-micrometer, symmetry-breaking surface corrugation to silicon substrates to increase light trapping
Publication Date: 2019.11.19 STC UNM
  • US10483415B2 patent drawing
  • US10483415B2 patent drawing
  • US10483415B2 patent drawing

AI summary

Provided is a method for fabricating a nanopatterned surface. The method includes forming a mask on a substrate, patterning the substrate to include a plurality of symmetry-breaking surface corrugations, and removing the mask. The mask includes a pattern defined by mask material portions that cover first surface portions of the substrate and a plurality of mask space portions that expose second surface portions of the substrate, wherein the plurality of mask space portions are arranged in a lattice arrangement having a row and column, and the row is not oriented parallel to a [110] direction of the substrate. The patterning the substrate includes anisotropically removing portions of the substrate exposed by the plurality of spaces.