Silicon Display Panel Exposure Segmentation
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Solution Overview
Problem
Existing silicon-based display panels face limitations in size due to the smaller exposure area of manufacturing machines, leading to difficulties in achieving high resolution and alignment accuracy during splicing exposure processes, resulting in poor display effects and low yield.
Innovation Solution
A method involving separate exposure processes for the display region and peripheral region using distinct sets of photomasks, where the display region is maximized within the effective exposure area without splicing, and peripheral circuits are exposed in a different process step to maintain alignment precision and improve yield and display quality.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If splicing exposure method is used to increase display panel size, then the display panel size can be enlarged beyond exposure machine limitations, but alignment accuracy deteriorates and display quality decreases
Solution Approach 1:
The patent divides the display panel into two separate exposure processes: display region exposure and peripheral circuit exposure. This segmentation allows each region to be exposed independently with dedicated photomasks, avoiding the alignment problems of splicing while still enabling large panel sizes by processing the display region within the exposure machine's effective area without requiring splicing of display pixels
Solution Approach 2:
The patent extracts the peripheral circuit exposure from the display region exposure process. By using separate photomasks and different process steps for peripheral circuits versus display regions, the patent eliminates the need for splicing in the display region, thereby maintaining high alignment accuracy and display quality while still achieving large panel sizes
2Area of stationary object
If splicing exposure is used to create large display panels, then panel size increases, but yield decreases due to alignment errors and display defects
Solution Approach 1:
The patent segments the exposure process into distinct steps for display regions and peripheral circuits using separate photomask sets. This prevents alignment errors between display pixels that would occur with splicing, thereby maintaining high display quality and increasing manufacturing yield while still enabling large panel production
Solution Approach 2:
By extracting peripheral circuit exposure as a separate process step with dedicated photomasks, the patent eliminates the source of alignment errors and display defects associated with splicing exposure. This increases yield by preventing uneven brightness and grayscale transition issues while maintaining the ability to produce large display panels
3Adaptability or versatility
If non-simultaneous exposures are used in different masks for display region, then process flexibility increases, but display quality deteriorates with uneven brightness and grayscale transitions
Solution Approach 1:
The patent extracts the display region exposure as a dedicated process step with its own photomask set, separate from peripheral circuit exposure. This ensures simultaneous exposure of all display pixels within the effective exposure area, maintaining uniform brightness and grayscale transitions while still allowing process flexibility through separate timing and parameter optimization for each exposure type
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances the yield and display effect by ensuring accurate alignment and preventing issues like uneven brightness and grayscale transitions, allowing for larger silicon-based display panels with improved manufacturing efficiency.
Implementation Method 1
providing a first set of photomasks corresponding to the display region, using the first set of photomasks in an exposure process for the display region
Implementation Method 2
using the first set of photomasks in an exposure process for the display region
Data Source
AI summary
A forming method for a silicon-based display panel includes providing a silicon substrate having a display region and a peripheral region surrounding the display region, providing a first set of photomasks corresponding to the display region, using the first set of photo masks in an exposure process of the display region, providing a second set of photomasks corresponding to the peripheral region, and using the second set of photomasks in an exposure process of the peripheral region. The exposure process of the display region and the exposure process of the peripheral region are different process steps. According to the forming method for the silicon-based display panel, splicing of pixel patterns in the display region is not carried out, so that the yield and the display effect are improved.