Silicon Photocathode Boron Layer Oxidation Prevention

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Solution Overview

Problem

Silicon-based photocathodes face limitations due to their high work-function and native oxide formation, which hinder the emission of photoelectrons, resulting in low efficiency and limited commercial use despite their potential for high purity and long electron recombination times.

Innovation Solution

A photocathode structure is developed using a silicon substrate with a boron layer to prevent oxidation and a low work-function layer, such as an alkali metal, to facilitate electron emission, enhancing the absorption of sub-1 μm wavelengths and reducing recombination probabilities.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If silicon is used as photocathode material, then light absorption efficiency is improved, but electron emission efficiency deteriorates due to high work-function

Engineering Contradiction:
Improvelight absorption efficiencyVSAvoidelectron emission efficiency
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

The patent combines silicon substrate with alkali metal layers (cesium, potassium, sodium) to create a composite photocathode structure. The silicon layer provides high light absorption efficiency while the alkali metal layers provide low work-function for efficient electron emission, resolving the contradiction between these two properties.

Inventive Principle:
Principle #40Composite materials

Solution Approach 2:

The patent applies different materials with different properties to different regions/layers of the photocathode structure. The silicon substrate maintains its intrinsic high absorption properties while the surface alkali metal layers provide the low work-function characteristic needed for electron emission, allowing each layer to optimize its local function.

Inventive Principle:
Principle #3Local quality

2Ease of manufacture

If silicon photocathode is exposed to air, then manufacturing is simplified, but performance deteriorates due to native oxide formation

Engineering Contradiction:
Improveprocessing simplicityVSAvoidphotoelectron emission performance
Core Design Contradiction:
Ease of manufactureVSReliability

Solution Approach 1:

The patent applies alkali metal layers to the silicon surface in advance, creating a protective low work-function coating before the silicon can oxidize. This preliminary action prevents oxide formation while maintaining manufacturing simplicity, as the alkali metal deposition is a straightforward process.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The alkali metal layers serve as an intermediary between the silicon substrate and the environment. They protect the silicon from oxidation while maintaining the desired photoelectric properties, acting as a mediator that prevents direct interaction between silicon and oxygen.

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration improves the efficiency of silicon-based photocathodes by enabling effective electron emission and increasing sensitivity across a wider spectral range, overcoming previous limitations and enabling their use in low-light sensing applications.

Implementation Method 1

a boron (first) layer formed on at least the output surface of the silicon substrate

Methodology Applied
Scientific EffectOxidation prevention: Oxidation

Implementation Method 2

Photocathodes comprise a photosensitive compound that, when struck by a quantum of light (photon), generates one (or more) electrons in response to each absorbed photon due to the photoelectric effect

Methodology Applied
Scientific EffectPhotoelectric effect: Photoelectric Effect

Data Source

PatentUS11081310B2Photocathode including silicon substrate with boron layer
Publication Date: 2021.08.03 KLA CORP
  • US11081310B2 patent drawing
  • US11081310B2 patent drawing
  • US11081310B2 patent drawing

AI summary

A photocathode is formed on a monocrystalline silicon substrate having opposing illuminated (top) and output (bottom) surfaces. To prevent oxidation of the silicon, a thin (e.g., 1-5 nm) boron layer is disposed directly on the output surface using a process that minimizes oxidation and defects. An optional second boron layer is formed on the illuminated (top) surface, and an optional anti-reflective material layer is formed on the second boron layer to enhance entry of photons into the silicon substrate. An optional external potential is generated between the opposing illuminated (top) and output (bottom) surfaces. The photocathode forms part of novel electron-bombarded charge-coupled device (EBCCD) sensors and inspection systems.