Negative-Working Photosensitive Siloxane Composition Without Post-Exposure Baking
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Solution Overview
Problem
Conventional negative-working photosensitive siloxane compositions require a post-exposure baking step for complete curing, which is energy-intensive and inefficient, and they lack high sensitivity and resolution in forming optical or physical characteristics for advanced display technologies.
Innovation Solution
A negative-working photosensitive siloxane composition comprising polysiloxane, a silicon-containing compound with an ureido bond, and a photo-polymerization initiator, which allows for light exposure and development without the need for post-exposure baking, achieving high sensitivity and resolution with excellent transparency, heat resistance, and chemical resistance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a conventional negative-working photosensitive siloxane composition is used, then the composition can be coated and exposed to light, but it requires a post-exposure baking step for complete curing which consumes energy and reduces production efficiency
Solution Approach 1:
The patent modifies the chemical composition parameters of the photosensitive system by selecting specific photo-polymerization initiators and silane compounds that enable complete curing through light exposure alone, eliminating the need for post-exposure baking and thereby reducing energy consumption while maintaining productivity
Solution Approach 2:
The patent extracts and removes the post-exposure baking step from the manufacturing process by designing a photosensitive composition that achieves complete curing during the light exposure step itself, eliminating this energy-intensive intermediate step and improving production efficiency
2Manufacturing precision
If a conventional negative-working photosensitive siloxane composition is used, then the composition can form a cured film, but it lacks high sensitivity and resolution for advanced display technologies
Solution Approach 1:
The patent employs a composite photosensitive composition containing specifically selected photo-polymerization initiators, silane compounds, and additives that work synergistically to achieve both high sensitivity for reliable exposure and high resolution for advanced display applications, overcoming the limitations of conventional single-component systems
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition forms a cured film that is superior in optical and physical characteristics, eliminating the need for post-exposure baking, enhancing production efficiency, and providing excellent performance in display technologies and semiconductor applications.
Implementation Method 1
a photo-polymerization initiator
Data Source
AI summary
To provide a negative-working photosensitive siloxane composition developable inorganically, and also to provide a cured film-manufacturing method employing that. The present invention provides a negative-working photosensitive siloxane composition comprising a polysiloxane, a silicon-containing compound having an ureido bond, a polymerization initiator, and a solvent. This composition is coat on a substrate, exposed to light, and developed, so that a cured film can be obtained without carrying out post-exposure baking.