Silylating Surface Treatment for Semiconductor Pattern Collapse

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Solution Overview

Problem

The challenge of pattern collapse in semiconductor devices arises due to surface tension during the drying process, leading to stress between adjacent patterns and potential breakage or separation, which decreases product yield and reliability.

Innovation Solution

A surface treatment agent comprising a silylating agent and a compound with an amide skeleton is used to impart water repellency to semiconductor substrates, forming a self-assembled monolayer that reduces surface tension and enhances hydrophobicity, thereby preventing pattern collapse.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a silylating agent is used to impart water repellency to prevent pattern collapse, then the reliability of semiconductor devices is improved, but the quality stability of the surface treatment agent deteriorates due to precipitation

Engineering Contradiction:
Improvereliability of semiconductor devicesVSAvoidquality stability of surface treatment agent
Core Design Contradiction:
ReliabilityVSStability of the object's composition

Solution Approach 1:

An amide compound is introduced as an intermediary substance to mediate between the silylating agent and water. The amide compound forms a complex with the silylating agent, preventing direct precipitation while maintaining water repellency functionality. This intermediary approach resolves the contradiction by stabilizing the surface treatment agent composition without compromising its effectiveness in preventing pattern collapse.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The invention creates a composite system consisting of a silylating agent and an amide compound working together. The amide compound acts as a stabilizing component that prevents precipitation of the silylating agent in aqueous environments. This composite material approach maintains both the water repellency function and the quality stability of the surface treatment agent throughout storage and usage.

Inventive Principle:
Principle #40Composite materials

2Productivity

If surface treatment is applied to prevent pattern collapse, then the yield of semiconductor products is improved, but the complexity of the manufacturing process increases

Engineering Contradiction:
Improveyield of semiconductor productsVSAvoidcomplexity of manufacturing process
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The surface treatment agent serves multiple functions simultaneously: it provides water repellency to prevent pattern collapse, maintains stability during storage without precipitation, and simplifies the manufacturing process by being a ready-to-use stable solution. This multi-functionality approach improves productivity while avoiding additional process complexity that would arise from separate stabilization steps.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The surface treatment agent stabilizes the quality of the semiconductor substrate, improving water repellency and preventing pattern collapse, thus enhancing the reliability and yield of semiconductor devices.

Implementation Method 1

forming a self-assembled monolayer that reduces surface tension and enhances hydrophobicity

Methodology Applied
Scientific EffectSelf-assembly: Self-Assembly

Implementation Method 2

a silylating agent (A) and a compound (C) having an amide skeleton in a molecule

Methodology Applied
Scientific EffectComplex formation: Chemical Bonding

Data Source

PatentUS11965111B2Surface treatment agent and surface treatment method
Publication Date: 2024.04.23 TOKYO OHKA KOGYO CO LTD
  • US11965111B2 patent drawing
  • US11965111B2 patent drawing
  • US11965111B2 patent drawing

AI summary

A surface treatment agent containing a silylating agent (A) and a compound (C) having an amide skeleton in a molecule, and a surface treatment method for subjecting an object to be treated to surface treatment using the surface treatment agent.