Single Radiation Source Imprint Lithography Apparatus
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current imprint lithography technologies face challenges with the cost and longevity of radiation sources, particularly mercury and mercury/xenon lamps, which degrade over time, and the need for separate sources for actinic and inspection radiation increases apparatus size and cost, with potential wavelength overlap causing unintended pattern fixation during inspection.
Innovation Solution
An imprint lithography apparatus and method utilizing a single radiation source that provides both actinic and inspection radiation, with a switch or selector to manage wavelength overlap, and an electrode-free laser-produced plasma radiation source to replace traditional lamps, ensuring stable and cost-effective operation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If a mercury or mercury/xenon lamp is used to provide actinic radiation, then the cost is reduced compared to a UV laser, but the lifetime is limited and stability decreases continually over time due to electrode degradation
Solution Approach 1:
The patent combines the actinic radiation source and inspection radiation source into a single mercury or mercury/xenon lamp, eliminating the need for separate UV laser and inspection light sources. This merging reduces overall system cost while the long lifetime and stable output characteristics of the lamp provide reliable long-term operation.
Solution Approach 2:
The single radiation source performs multiple functions: it provides actinic radiation for pattern fixation and inspection radiation for monitoring the imprinting process. This multi-functionality eliminates the need for separate radiation sources, reducing cost and improving reliability by using a proven long-lived lamp technology for both purposes.
2Adaptability or versatility
If separate sources are used for actinic radiation and inspection radiation, then the functionality is improved, but the apparatus size and cost increase
Solution Approach 1:
The patent merges the actinic radiation source and inspection radiation source into a single radiation source, significantly reducing apparatus size and cost. The single source eliminates the need for separate UV lasers and inspection light sources, while maintaining both functionalities through wavelength separation.
Solution Approach 2:
The patent segments the radiation spectrum from a single source into different wavelength components: actinic radiation for pattern fixation and inspection radiation for process monitoring. This segmentation is achieved through optical filters and wavelength-selective optics, allowing one source to perform multiple functions without interference.
3Device complexity
If a single radiation source is used for both actinic and inspection radiation, then the cost and size are reduced, but wavelength overlap may cause unintended pattern fixation during inspection
Solution Approach 1:
The patent segments the radiation spectrum from the single source into distinct wavelength bands using optical filters. The inspection radiation is selected at wavelengths that do not overlap with the actinic radiation wavelengths, preventing unintended pattern fixation during inspection. This spectral segmentation allows both functions to coexist without harmful interference.
Solution Approach 2:
The patent introduces optical filters and wavelength-selective optics as intermediaries between the single radiation source and the respective functions. These intermediaries selectively transmit or block specific wavelength ranges, ensuring that inspection radiation does not trigger pattern fixation while actinic radiation effectively cures the imprintable medium.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution reduces the cost and size of the lithography apparatus, maintains radiation intensity over time, and prevents unintended pattern fixation during inspection, enhancing throughput and efficiency by using a single radiation source and eliminating electrode degradation issues.
Implementation Method 1
an electrode-free laser-produced plasma radiation source
Implementation Method 2
laser-produced plasma radiation source
Implementation Method 3
The patterned surface of the imprint lithography template and the patterned imprintable medium are then separated. The substrate and patterned imprintable medium are then typically processed further in order to pattern or further pattern the substrate
Data Source
AI summary
An imprint lithography apparatus is disclosed which includes a pattern fixing system configured to use actinic radiation to fix a pattern provided in a layer of imprintable medium by an imprint lithography template, and an inspection system configured to use inspection radiation to inspect an element constituting or, in use, being located within, the imprint lithography apparatus. The imprint lithography apparatus is configured such that the pattern fixing system and the inspection system are provided, in use, with, respectively, actinic radiation and inspection radiation from a single source of radiation.