Enclosed Sinusoidal Trajectory for Nanolithography Speed
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Solution Overview
Problem
Scanning probe nanofabrication techniques face limitations in fabrication speed due to the use of traditional raster scan patterns, which restrict the creation of complex patterns and are inefficient for high-throughput nanolithography.
Innovation Solution
Implementing an enclosed sinusoidal trajectory using sine and cosine waveforms to drive the scanning process, allowing for faster fabrication and control over pattern shapes, dimensions, and line density, enabling the creation of complex patterns like rectangular, circular, and elliptical shapes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If traditional raster scan patterns are used for scanning probe nanofabrication, then simple linear patterns can be fabricated, but fabrication speed is limited to several nanometers per second and complex patterns cannot be efficiently created
Solution Approach 1:
The patent applies dynamics by transitioning from static raster scan patterns to dynamic enclosed sinusoidal trajectories. The tip moves along continuous closed-loop paths (such as Lissajous figures) that adapt to complex pattern requirements, enabling both high-speed operation and versatile pattern creation. The dynamic trajectory allows the system to maintain high fabrication speed while simultaneously creating complex 2D and 3D patterns that were impossible with traditional raster scanning.
2Adaptability or versatility
If vector-scan controlled nanolithography is used to move the tip along a desired path for complex patterns, then pattern versatility is improved, but fabrication speed is limited to several nanometers per second
Solution Approach 1:
The patent employs periodic action through enclosed sinusoidal trajectories that follow continuous closed-loop paths. By using periodic Lissajous figures and sinusoidal motion patterns, the system achieves high-speed fabrication while maintaining the ability to create complex patterns. The periodic nature of the trajectories allows for efficient coverage of the fabrication area at speeds much higher than vector-scan methods, eliminating the speed limitation while preserving pattern versatility.
3Productivity
If enhanced raster scan patterns with rotating-tip-based techniques or in-plane circular vibration are used, then lithographic throughput is increased, but the tip performs circular motions that may limit pattern versatility
Solution Approach 1:
The patent applies universality by designing enclosed sinusoidal trajectories that can generate multiple pattern types (rectangular, circular, elliptical, and custom 2D/3D patterns) from a single methodology. The system is not limited to circular motions like rotating-tip techniques, but can produce diverse geometries by modifying the trajectory parameters. This multi-functional approach maintains high lithographic throughput while providing unrestricted pattern shape control and versatility.
Data Source
AI summary
Provided among other things are a scanning electron microscope, scanning transmission electron microscope, focused ion beam microscope, ion beam micromachining device, or scanning probe nanofabrication device, wherein the microscope or device is configured to move a substrate and a scanning modality relative to one another with an enclosed sinusoidal trajectory, and methods of operation.