Slanted Opening Controls Gas Conductance for Ashing Uniformity
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Solution Overview
Problem
In semiconductor manufacturing, the strong intake force near the gas exhaust port in plasma process apparatuses leads to non-uniform ashing processes due to gas exhaust shifts within the treatment chamber, making it difficult to maintain process uniformity.
Innovation Solution
A plasma process apparatus with a ring-like diffusion path and a slanted opening between the diffusion path and the treatment chamber, where the opening area narrows closer to the exhaust port, controls gas conductance to reduce gas exhaust shifts and improve process uniformity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a current plate is provided in the gas exhaust space to suppress exhaust gas shift, then the generation of exhaust gas shift is reduced, but the intake force of gas becomes strong near the exhaust port making it difficult to remove the shift
Solution Approach 1:
The invention changes the geometric parameters of the opening by making it slanted rather than uniform, with the opening area being narrower at positions closer to the exhaust port. This parameter modification allows the opening to control gas conductance differently at different locations, canceling exhaust gas shift while maintaining effective gas intake without requiring complex additional components like current plates
Solution Approach 2:
The opening is designed with non-uniform properties - the opening area varies depending on the position relative to the exhaust port, being narrower closer to the exhaust port and wider farther away. This local quality variation allows different regions of the opening to perform different functions: controlling exhaust gas shift near the port while maintaining adequate conductance farther away
2Manufacturing precision
If the opening area is made uniform throughout, then the structure is simple, but gas exhaust shift cannot be effectively canceled
Solution Approach 1:
The opening area parameter is changed from uniform to non-uniform distribution, with the area being narrower at positions closer to the exhaust port and wider at positions farther away. This parameter change enables the opening to cancel exhaust gas shift while remaining manufacturable as a single integrated structure
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively cancels gas exhaust shifts, enhancing the uniformity of the ashing process, particularly at high flow rates and pressures, and widens the process window, while maintaining cost-effectiveness.
Implementation Method 1
an opening that is present between the member having the diffusion path and the reaction container to cause the diffusion path and a space of the treatment chamber to communicate, an opening area of the opening being narrower as a position of the opening area is closer to the exhaust port
Data Source
AI summary
In a processing device including a reaction container that receives a gas flowing into the reaction container and performs a predetermined process in a treatment chamber, a member that communicates with an exhaust port at a portion in which a diffusion path of a sidewall or a bottom wall of the reaction container is formed, and an opening that is present between the member having the diffusion path and the reaction container to cause the diffusion path and a space of the treatment chamber to communicate, in order to avoid a shift of the gas in the treatment chamber, an opening area of the opening is made narrower as a position of the opening area is closer to the exhaust port.