Soft Breakdown Antifuse Memory Cell Low Power

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Solution Overview

Problem

Conventional non-volatile memory (NVM) cells require high power for programming and reading, especially due to the need for hard breakdown of the gate oxide, which results in high voltage drops and inefficient signal levels.

Innovation Solution

The implementation of an antifuse-based NVM cell using a field-effect transistor that operates with a modest programming voltage under 5.5 volts and achieves soft breakdown in the thin gate oxide, allowing for low-power operation through a local sense transistor that amplifies the programming current for column sense amplifiers.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If hard breakdown of gate oxide is used for programming, then reliable data storage is achieved, but programming power consumption increases significantly

Engineering Contradiction:
Improvedata storage reliabilityVSAvoidprogramming power consumption
Core Design Contradiction:
ReliabilityVSUse of energy by moving object

Solution Approach 1:

The patent changes the breakdown mode parameter from hard breakdown to soft breakdown, and adjusts the gate oxide thickness to 50-150nm. This parameter change allows the gate oxide to achieve a high-resistance state (10^6 to 10^9 ohms) that provides reliable data storage without requiring the high current (hundreds of microamperes) needed for hard breakdown, thus reducing programming power consumption to a few microamperes

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

Instead of applying excessive voltage and current to achieve hard breakdown, the patent applies partial action by using moderate programming voltage (under 5.5V) and current (a few microamperes) to achieve soft breakdown. This partial action is sufficient to create the high-resistance state needed for data storage while avoiding the excessive power consumption of hard breakdown

Inventive Principle:
Principle #16Partial or excessive action

2Power

If hard breakdown is used to achieve low resistance for reading, then reasonable sense current is obtained, but read voltage requirement increases to >2.5-3.3V

Engineering Contradiction:
Improvesense currentVSAvoidread voltage
Core Design Contradiction:
PowerVSUse of energy by moving object

Solution Approach 1:

The patent changes the resistance parameter of the gate oxide from low resistance (hard breakdown) to high resistance (10^6 to 10^9 ohms). This parameter change enables reading operation at low voltage (0.5-1V) because the high resistance creates sufficient voltage drop and signal level even with low sense current, eliminating the need for high read voltage (>2.5-3.3V)

Inventive Principle:
Principle #35Parameter changes

3Measurement precision

If high sense current (1-10 μA) is used for reading, then adequate signal level is achieved, but voltage drop over high resistance requires >2.5-3.3V

Engineering Contradiction:
Improvesignal levelVSAvoidread voltage
Core Design Contradiction:
Measurement precisionVSUse of energy by moving object

Solution Approach 1:

The patent changes the gate oxide resistance parameter to high resistance (10^6 to 10^9 ohms), which fundamentally alters the voltage-current relationship. This allows adequate signal level to be achieved at low voltage (0.5-1V) because the high resistance amplifies the voltage signal even with low sense current, eliminating the need for high read voltage that would be required with low resistance

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach reduces programming current from hundreds of microamperes to a few microamperes and allows for reading with voltages as low as 0.5-1 volt, making the technology suitable for low-power applications like RFID memory without requiring hard breakdowns.

Implementation Method 1

Only a soft breakdown is needed in the thin gate oxide because a local sense transistor is used during read operations to detect the programming and amplify it for column sense amplifiers

Methodology Applied
Scientific EffectSoft breakdown: Avalanche Breakdown

Data Source

PatentUS8797820B2Soft breakdown mode, low voltage, low power antifuse-based non-volatile memory cell
Publication Date: 2014.08.05 SICHUAN KILOWAY TECHNOLOGIES CO LTD
  • US8797820B2 patent drawing
  • US8797820B2 patent drawing
  • US8797820B2 patent drawing

AI summary

A non-volatile memory cell using two transistors, a bit select and a sense device and an antifuse device. The antifuse device is implemented with a field-effect transistor operated to behave like an antifuse when the cell is selected and a modest programming voltage under 5.5 volts and a current under 5-μA is applied. Only a soft breakdown is needed in the thin gate oxide because a local sense transistor is used during read operations to detect the programming and amplify it for column sense amplifiers. Reading also only requires low voltages of about one volt.