Soft Lithography Master Mold for LCD Pattern Formation
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Solution Overview
Problem
The existing methods for fabricating liquid crystal display (LCD) devices, particularly the photolithographic techniques, result in high processing costs and complex processes, leading to a high defect rate and difficulty in managing production yield.
Innovation Solution
A master mold and method using soft lithography, where a hydrophobic group is applied to the surface of the master mold and a soft mold with a predetermined pattern is used to form substrates for LCD devices, eliminating the need for photolithography and reducing defect rates.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If photolithographic techniques are used for fabricating LCD devices, then pattern formation can be achieved, but processing costs increase and production yield decreases due to complex processes and high defect rates
Solution Approach 1:
The patent uses a master mold with a predetermined pattern to create soft molds through copying. The soft mold replicates the pattern from the master mold and is then used to form patterns on substrates. This copying approach simplifies the fabrication process and reduces defects compared to direct photolithography, thereby improving production yield while maintaining pattern formation precision.
2Manufacturing precision
If photolithographic techniques are used for fabricating LCD devices, then pattern formation can be achieved, but processing costs increase due to complex processes
Solution Approach 1:
The patent employs a master mold that contains a predetermined pattern, which is copied to create soft molds. These soft molds are then used to transfer patterns to substrates. This copying method eliminates the need for complex photolithographic processes including photoresist coating, exposure, and development steps, thereby reducing processing costs while maintaining pattern formation precision.
Solution Approach 2:
The patent replaces the optical-based photolithographic system with a mechanical contact-based soft lithography system. The soft mold physically contacts the substrate to transfer patterns, substituting the complex optical alignment and exposure machinery with a simpler mechanical stamping process, thereby reducing processing costs.
3Manufacturing precision
If photolithographic techniques are used for fabricating LCD devices, then pattern formation can be achieved, but the process becomes complex leading to high defect rates
Solution Approach 1:
The patent uses a master mold with a predetermined pattern to create soft molds through copying. The soft mold replicates the pattern from the master mold and is then used to form patterns on substrates. This copying approach simplifies the fabrication process and reduces defects compared to direct photolithography, thereby improving production yield while maintaining pattern formation precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach decreases processing costs and increases production yield by simplifying the pattern formation process and reducing defects in the soft mold fabrication, making it a more efficient alternative to traditional photolithographic methods.
Implementation Method 1
a hydrophobic group on a surface of the main body
Data Source
AI summary
A method for fabricating a liquid crystal display (LCD) device wherein a photolithography technique is replaced by soft lithography is disclosed. The method includes: forming a thin film transistor array substrate; forming a color filter substrate; bonding the thin film transistor array substrate and the color filter substrate; and applying a liquid crystal between the thin film transistor array substrate and the color filter substrate, wherein at least one of the forming the thin film transistor array substrate and the forming the color filter substrate includes a pattern forming method using a soft mold. The pattern forming method may be a soft lithography process that includes: contacting a soft mold having a particular pattern with a surface of a buffer layer and applying a constant heat to the soft mold and buffer layer to transfer the particular pattern onto the buffer layer.