Solder Ball Alignment via Polymer Recess in IC Packages

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

In integrated circuit manufacturing, existing methods face challenges in accurately aligning solder balls to metal pads due to shifting during the reflow process, leading to potential misalignment with conductive features on package components.

Innovation Solution

A method involving a partial-tone photolithography mask is used to pattern a polymer layer, creating a recess that aligns with the solder ball, ensuring accurate positioning and reducing misalignment by forming a Post-Passivation Interconnect (PPI) structure with a PPI pad extending into the recess, allowing for self-aligned solder ball placement and reflow.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If traditional solder ball placement methods are used, then manufacturing process is simple, but solder ball alignment accuracy deteriorates due to shifting during reflow

Engineering Contradiction:
Improvesolder ball alignment accuracyVSAvoidmanufacturing process complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent applies preliminary action by forming a recess in the polymer layer before placing the solder ball. This recess pre-positioning structure guides the solder ball into the correct location before reflow, preventing misalignment that would otherwise occur during the reflow process. The recess is created through photolithography patterning of the polymer layer, establishing the alignment feature in advance of solder ball placement.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent introduces an intermediary structure - the recess in the polymer layer - that mediates between the solder ball placement process and the final alignment requirement. This recess acts as a physical guide or mediator that ensures the solder ball is positioned correctly relative to the underlying conductive features, eliminating the need for complex alignment systems while maintaining high precision.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Manufacturing precision

If solder ball placement is performed without alignment features, then manufacturing cost is low, but alignment accuracy deteriorates leading to misalignment with conductive features

Engineering Contradiction:
Improvesolder ball to conductive feature alignmentVSAvoidmanufacturing process simplicity
Core Design Contradiction:
Manufacturing precisionVSEase of manufacture

Solution Approach 1:

The alignment recess is created as a preliminary feature during the polymer layer formation stage, before solder ball placement. This pre-established geometric feature provides inherent alignment guidance without requiring complex placement equipment or additional alignment steps, thus maintaining ease of manufacture while improving precision.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The recess structure enables self-alignment, where the solder ball naturally positions itself within the recess during placement. This self-service mechanism eliminates the need for external alignment systems or complex positioning procedures, maintaining manufacturing simplicity while achieving high alignment accuracy between solder balls and conductive features.

Inventive Principle:
Principle #25Self-service

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enhances the accuracy of solder ball alignment without increasing manufacturing costs, ensuring precise positioning and reducing misalignment issues during the assembly of package components.

Implementation Method 1

A method involving a partial-tone photolithography mask is used to pattern a polymer layer

Methodology Applied
Scientific EffectPhotolithography: Photopolymerisation

Data Source

PatentUS10879198B2Package with solder regions aligned to recesses
Publication Date: 2020.12.29 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US10879198B2 patent drawing
  • US10879198B2 patent drawing
  • US10879198B2 patent drawing

AI summary

A method includes forming a passivation layer over a portion of a metal pad, forming a polymer layer over the passivation layer, and exposing the polymer layer using a photolithography mask. The photolithography mask has an opaque portion, a transparent portion, and a partial transparent portion. The exposed polymer layer is developed to form an opening, wherein the metal pad is exposed through the opening. A Post-Passivation Interconnect (PPI) is formed over the polymer layer, wherein the PPI includes a portion extending into the opening to connect to the metal pad.