Solid-State Plasma Initiator for Reliable Nano Deposition
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Solution Overview
Problem
Current plasma initiation methods in high current power processes, such as ionic and nano plasma deposition, rely on mechanical devices that are prone to failure, contamination, and lack precise control over power output, leading to unreliable and inefficient surface coating processes, particularly in medical device applications where controlled surface texture and particle size are critical.
Innovation Solution
A solid-state relay-based plasma initiator with an integrated power supply control unit, including resistors and Insulated Gate Bipolar Transistors (IGBTs), that allows for precise control of plasma initiation and macroparticle size, eliminating the need for mechanical parts and external sensors, enabling reliable and repeatable plasma initiation at lower energy levels and independent of location.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If mechanical initiators are used to start plasma arcs, then plasma initiation can be achieved, but the system suffers from high failure rates, contamination, and lack of reliability
Solution Approach 1:
The patent replaces mechanical initiators with a solid-state electronic control system that uses electrical signals to initiate plasma arcs. The controller sends voltage signals through circuitry to the cathode target, eliminating mechanical moving parts, contact wear, and contamination from mechanical trigger materials while improving reliability and reducing maintenance requirements
Solution Approach 2:
The patent introduces an electronic controller as an intermediary between the power supply and the plasma generation process. This controller mediates the initiation process by precisely controlling voltage and current delivery to the target, enabling reliable plasma start-up without direct mechanical contact or contamination of the vacuum chamber components
2Productivity
If high current power processes are used for plasma deposition, then deposition rate is improved, but precise control over power output is lost
Solution Approach 1:
The patent implements dynamic power control through electronic circuitry that can adjust voltage and current delivery in real-time during the deposition process. The controller modifies power parameters based on process requirements, enabling both high deposition rates and precise control over power output, macroparticle size, and surface texture characteristics
Solution Approach 2:
The patent changes power delivery parameters (voltage, current, pulse duration) dynamically during the deposition process to control macroparticle size and surface properties. By adjusting these electrical parameters, the system achieves precise control over deposition characteristics while maintaining high productivity through optimized power levels
3Ease of operation
If mechanical devices are used for plasma initiation, then arc can be started, but the devices are susceptible to high failure rates and require frequent maintenance
Solution Approach 1:
The patent replaces mechanical initiation devices with an electronic control system that uses electrical signals to start plasma arcs. This substitution eliminates mechanical wear, contact fatigue, and the need for physical adjustment mechanisms, dramatically reducing maintenance frequency while maintaining ease of operation through simple electronic control
4Manufacturing precision
If external mechanical switching mechanisms are used to control power delivery, then power control is achieved, but the system becomes complex and less reliable
Solution Approach 1:
The patent merges the power control functionality directly into the plasma power supply system, integrating voltage and current regulation circuits with the main power delivery mechanism. This consolidation eliminates the need for separate external switching mechanisms and sensors, reducing system complexity while maintaining precise power delivery control for macroparticle size management
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution provides reliable, repeatable, and reusable plasma initiation with precise control over plasma arc and macroparticle size, enhancing surface quality and functionality in medical applications by reducing particle size variability and improving deposition rate control.
Implementation Method 1
A plasma initiator and power distribution system includes: a solid state relay, a power supply including a power supply control unit, a resistor coupled between the solid state relay and the power supply, and a point of contact for a plasma source coupled to the negative side of the power supply
Implementation Method 2
The subject invention pertains to an apparatus and method for initiation of a plasma, in particular a plasma initiator and power distribution system
Implementation Method 3
a resistor coupled between the solid state relay and the power supply
Implementation Method 4
A solid-state relay-based plasma initiator with an integrated power supply control unit, including resistors and Insulated Gate Bipolar Transistors (IGBTs), that allows for precise control of plasma initiation and macroparticle size
Implementation Method 5
Ionic Plasma Deposition (IPD) is a basic technology employed in coating and other processes where a plasma is deposited on a substrate
Implementation Method 6
A metal plasma produced by this method is generated from a cathode target onto a substrate, which acts as the anode
Data Source
AI summary
An apparatus and method for initiation and control of a sustained metal plasma and nano plasma (macroparticulate) deposition methods for preparing modified metal coatings are provided. The plasma deposition process can be tightly controlled by virtue of a device that incorporates a plasma arc initiator component and an internal power supply that is capable of controlling dwell time on the target and the size range of particles ejected in the plasma arc.