Integrating Scanning Particle and Probe Microscopes in Vacuum
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Solution Overview
Problem
Combining scanning particle microscopes and scanning probe microscopes in a single device is hindered by space constraints and mutual interference, limiting their performance and applicability, especially for large samples like photomasks.
Innovation Solution
Spatially and temporally separating the scanning particle microscope and scanning probe microscope within a common vacuum chamber, allowing for independent operation and use of a locator chip to determine and maintain the distance between their interaction points, thereby avoiding mutual interference and enhancing the analysis of large samples.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If scanning particle microscope and scanning probe microscope are combined in a single device, then comprehensive information of sample topography and material composition can be obtained, but space constraints and mutual interference limit their performance
Solution Approach 1:
The patent divides the measurement process into separate temporal segments rather than simultaneous operation. The scanning particle microscope and scanning probe microscope operate sequentially in time, with the sample being transported between them. This segmentation resolves the spatial conflict by using time division, allowing both instruments to share the same vacuum chamber without interfering with each other's measurements.
Solution Approach 2:
The patent introduces the time dimension as an additional degree of freedom to resolve the spatial conflict. Instead of attempting to position both microscopes simultaneously in space (which creates interference), the system uses temporal separation - one microscope operates, then the sample is transported, then the other microscope operates. This transforms a spatial problem into a temporal solution.
2Ease of operation
If two separate tools are used for sample analysis, then each tool can operate independently, but the sample must be removed from vacuum chamber destroying vacuum for each measurement
Solution Approach 1:
The patent merges two separate measurement tools into a single integrated system that shares a common vacuum chamber and sample stage. Both the scanning particle microscope and scanning probe microscope are positioned within the same vacuum environment, allowing the sample to remain in vacuum throughout both measurement processes. This eliminates the need to break vacuum between measurements while maintaining independent operational capability of each tool.
3Measurement precision
If scanning probe microscope uses high resolution to scan small sections, then atomic range resolution is achieved, but application to large samples is limited
Solution Approach 1:
The patent segments the measurement process into two distinct stages: first, the scanning particle microscope performs low-magnification overview scanning of large sample areas to identify regions of interest; second, the scanning probe microscope performs high-resolution atomic-scale measurement of specific small sections. This segmentation allows each tool to operate in its optimal performance range without compromise.
Solution Approach 2:
The scanning particle microscope performs preliminary scanning and localization of large sample areas before the scanning probe microscope performs detailed high-resolution measurement. This preliminary action identifies and marks regions of interest, allowing the subsequent high-resolution measurement to focus only on relevant areas, thus combining large-area coverage with atomic-scale precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enables the analysis of large samples with improved image quality and allows for local modification of the sample surface through chemical processes, enhancing the tools' performance and versatility.
Implementation Method 1
Back-scattered electrons or secondary electrons which are released by locally impinging particles are measured with a detector
Implementation Method 2
Back-scattered electrons or secondary electrons which are released by locally impinging particles are measured with a detector
Implementation Method 3
the probe or the test prod is deflected by atomic forces of the sample surface which are typically Van-der-Waals forces
Implementation Method 4
a variable voltage is applied to the STM and the resulting tunnel current is measured
Data Source
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AI summary
The present invention refers to an apparatus and a method for investigating an object with a scanning particle microscope (120) and at least one scanning probe microscope (140) with a probe, wherein the scanning particle microscope (120) and the at least one scanning probe microscope (140) are spaced with respect to each other in a common vacuum chamber (102) so that a distance between the optical axis of the scanning particle microscope (120) and the measuring point (195) of the scanning probe microscope (140) in the direction perpendicular to the optical axis of the scanning particle microscope (120) is larger than the maximum field of view of both the scanning probe microscope (140) and the scanning particle microscope (120), wherein the method comprises the step of determining the distance between the measuring point (195) of the scanning probe microscope (140) and the optical axis of the scanning particle microscope (120).