Space Imaging Overlay Inspection for Array Substrates
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Solution Overview
Problem
In the manufacturing of array substrates for TFT-LCDs, transparent thin films formed by photolithography pose a challenge for accurate and quick positioning of space imaging overlay marks during inspections, leading to inefficiencies in the photolithography process.
Innovation Solution
A color developing treatment is applied to the space imaging overlay marks on transparent thin films, using gases like ammonia and silicane in a vacuum environment to create a non-transparent color, enabling precise overlay inspections between transparent and adjacent thin films.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If overlay inspection is conducted on transparent thin film without color developing treatment, then the inspection process is simple, but the overlay mark cannot be positioned accurately and inspection time increases
Solution Approach 1:
The patent applies color developing treatment to overlay marks on transparent thin films using ammonia gas and silicane gas in a vacuum environment. This creates a non-transparent color on the overlay marks, making them visible and easily positionable during inspection, thereby improving both positioning accuracy and reducing inspection time.
Solution Approach 2:
The patent changes the optical parameters of the overlay marks by treating them with specific gases (ammonia and silicane) in a vacuum environment. This transformation changes the marks from transparent to non-transparent, enabling accurate and quick positioning during overlay inspection without complicating the overall process.
2Measurement precision
If color developing treatment is applied to make overlay marks visible, then positioning accuracy improves, but process complexity increases
Solution Approach 1:
The patent uses gas ejection (pneumatics) to deliver ammonia gas and silicane gas to the overlay marks in a vacuum environment. This approach achieves color development through gas-phase chemical reactions, avoiding the need for liquid chemicals or complex coating equipment, thus minimizing process complexity while improving positioning accuracy.
Solution Approach 2:
The patent employs a vacuum environment for the color developing treatment, creating an inert atmosphere that prevents unwanted chemical reactions and ensures controlled interaction between the gases and overlay marks. This simplifies the process by eliminating the need for additional protective atmospheres or complex environmental controls.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The treatment allows for accurate and efficient positioning of overlay marks, enhancing the speed and accuracy of overlay inspections by making the marks visible, thus improving the alignment precision in the photolithography process.
Implementation Method 1
ejecting gas to a region where the space imaging overlay mark on the transparent thin film is located in an environment subject to a vacuum treatment, wherein the gas is capable of conducting a haze reaction with the space imaging overlay mark, so that the space imaging overlay mark subject to the haze reaction appears in the non-transparent color
Data Source
AI summary
Embodiments of the invention discloses a space imaging overlay inspection method and an array substrate; the method comprises: forming a thin film having a space imaging overlay mark by photolithography; when the thin film is a transparent thin film, performing a color developing treatment on the space imaging overlay mark on the transparent thin film, so as to make the space imaging overlay mark appear in a non-transparent color; and conducting a space imaging overlay inspection between the transparent thin film and an adjacent thin film by using the space imaging overlay mark appear appearing in the non-transparent color. In the method, by conducting the color developing treatment to the space imaging overlay mark on the transparent thin film and then conducting positioning, the space imaging overlay mark can be positioned quickly and accurately, thus alignment condition between two photolithography procedures can be detected swiftly and effectively.