Spatial Light Modulator Bias Voltage Control for Exposure Speed

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Solution Overview

Problem

Existing maskless exposure devices for forming circuit patterns on substrates face bottlenecks in exposure speed due to the time required for micro-mirror orientation changes, which hinder production capacity.

Innovation Solution

An exposure device utilizing a spatial light modulator with a bias voltage controller to switch reflection elements between states quickly, reducing the light modulation time by half, and using high-intensity optical sources like super high-pressure mercury lamps to enhance exposure efficiency.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If conventional spatial light modulators with multiple orientation states are used, then light control flexibility is improved, but the orientation change time increases and exposure speed deteriorates

Engineering Contradiction:

Improvelight control flexibilityVSAvoidexposure speed

Core Design Contradiction:

Adaptability or versatilityVSSpeed

Solution Approach 1:

The invention extracts and eliminates the unnecessary intermediate orientation states from the spatial light modulator, keeping only the essential two states (parallel and perpendicular to the substrate). This removal of redundant states reduces the orientation change time while preserving the core light control functionality needed for exposure operations.

Inventive Principle:

Principle #2Taking out (Extraction)

Solution Approach 2:

Instead of using multiple intermediate orientation states to control light, the invention inverts the approach by using only two extreme states (0° and 90°) where one state allows light passage and the other blocks it. This inversion simplifies the state transition process and reduces the time required for orientation changes.

Inventive Principle:

Principle #13The other way round (Inversion)

2Ease of manufacture

If maskless exposure operation is implemented, then maintenance properties are improved, but the time required for micro-mirror orientation changes increases and production capacity deteriorates

Engineering Contradiction:

Improvemaintenance propertiesVSAvoidproduction capacity

Core Design Contradiction:

Ease of manufactureVSProductivity

Solution Approach 1:

The invention replaces the conventional mechanical rotation system with a simplified two-state orientation system that uses electrostatic or magnetic fields to achieve rapid state transitions. This substitution eliminates the complex mechanical structures required for multi-position rotation, reducing transition time and improving production capacity while maintaining the maskless operation advantage.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

3Speed

If photosensitive material with improved sensitivity is used, then reaction speed is improved, but the spatial light modulation time remains critical and exposure efficiency deteriorates

Engineering Contradiction:

Improvereaction speedVSAvoidspatial light modulation time

Core Design Contradiction:

SpeedVSLoss of time

Solution Approach 1:

The invention applies preliminary action by pre-positioning the spatial light modulator in the required orientation state before exposure begins, and maintaining this state throughout the exposure process. This eliminates the need for orientation changes during exposure, ensuring that the spatial light modulation time does not become a bottleneck even when using highly sensitive photosensitive materials.

Inventive Principle:

Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The exposure device achieves significantly shorter exposure operation times by reducing the spatial light modulation time and ensuring efficient light control, thereby improving production capacity.

Implementation Method 1

a bias voltage controller which applies a first voltage to the reflection elements, thereby setting the reflection elements to a first state and which does not apply a voltage to the reflection elements, thereby setting the reflection elements to a second state

Methodology Applied

Scientific EffectElectrostatic actuation: Electrostatics

Implementation Method 2

at least one spatial light modulator which includes a plurality of reflection elements being arranged in a matrix fashion; at least one optical source which supplies exposure light to the reflection elements

Methodology Applied

Scientific EffectLight reflection: Reflection

Data Source

PatentUS7924407B2Exposure device

Publication Date: 2011.04.12 ORC MFG

AI summary

The present invention relates to an exposure device for forming circuit patterns onto a surface of an object. The exposure device includes at least one spatial light modulator which includes a plurality of reflection elements being arranged in a matrix fashion, at least one optical source which supplies exposure light to the reflection elements, and a bias voltage controller which applies a first voltage to the reflection elements, thereby setting the reflection elements to a first state and which does not apply a voltage to the reflection elements, thereby setting the reflection elements to a second state. In addition, the exposure light is delivered to the surface of the object in the first state, and the exposure light is not delivered to the surface of the object in the second state.