Sputtering Apparatus Magnet Unit Repulsive Force Mechanism
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Solution Overview
Problem
Sputtering apparatuses face challenges in target replacement due to strong attractive forces between the magnet unit and the target, which increase with target thickness, leading to inefficient operation and prolonged process stop times.
Innovation Solution
Incorporating a force generation portion, such as coil springs or Belleville springs, between the support members to generate a repulsive force opposing the attractive force, allowing for efficient target replacement and reduced torque requirements during magnet unit movement.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Illumination intensity
If a magnet unit with high energy product is used to generate sufficient magnetic flux density on the target surface, then the magnetic flux density is improved, but the attractive force between the magnet unit and the target increases significantly
Solution Approach 1:
The patent introduces a repulsive force mechanism that acts in opposition to the attractive force between the magnet unit and target. This repulsive force serves as a counterbalancing force, reducing the net force that the driving unit must overcome during target replacement, thereby resolving the contradiction between maintaining high magnetic flux density and managing the resulting attractive force.
Solution Approach 2:
The patent converts the harmful effect of the strong attractive force into a beneficial configuration by designing a support structure with repulsive force generation portions. These portions utilize the magnetic field interaction to generate repulsive forces that actually assist in the target replacement process, turning the originally problematic strong magnetic attraction into a controllable and manageable system.
2Productivity
If the target is made thicker to improve the operating rate of the film forming apparatus, then the productivity is improved, but the attractive force between the magnet unit and the target increases
Solution Approach 1:
By introducing repulsive force generation portions in the support structure, the patent creates a counterbalancing force that offsets the increased attractive force resulting from thicker targets. This allows the system to maintain higher productivity with thicker targets without being constrained by the proportionally increased attractive forces.
3Force
If the rated power of the driving source is increased to overcome the strong attractive force, then the force capability is improved, but the efficiency decreases due to mismatch with the actual varying attractive force
Solution Approach 1:
The repulsive force mechanism provides a counterbalancing force that reduces the net force requirement during target replacement. This allows the use of a driving source with lower rated power that is better matched to the actual varying force requirements, improving efficiency while still having sufficient force capability when needed.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The repulsive force mechanism reduces the load on the driving unit, enabling easier target replacement and maintaining sufficient magnetic flux density for discharge, thus improving operational efficiency and reducing process stop times.
Implementation Method 1
a force (an attractive force in many cases) acting between the magnet unit and the target
Implementation Method 2
adjusting the magnetic flux density on the target surface
Implementation Method 3
Incorporating a force generation portion, such as coil springs or Belleville springs, between the support members to generate a repulsive force
Data Source
AI summary
A sputtering apparatus includes a target electrode capable of mounting a target, a first support member which supports the target electrode, a magnet unit which forms a magnetic field on a surface of the target, a second support member which supports the magnet unit, and a force generation portion which is provided between the first support member and the second support member, and generates a second force in a direction opposite to a first force that acts on the second support member by an action of the magnetic field formed between the target and the magnet unit, wherein the second force has a magnitude which increases as the magnet unit comes closer to the target electrode.