Sputtering Target Corner Chamfering with Arc Blade

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Solution Overview

Problem

Existing methods for processing sputtering targets fail to accurately chamfer corner portions between sputtering surfaces and side surfaces, leading to scratches and suboptimal approximation to aimed R faces.

Innovation Solution

A method involving a cutting tool with an arc-shaped concave curved surface is used to chamfer the corner portions of sputtering targets, ensuring the curvature radius of the blade portion is equal to or greater than the aimed R face, and positioning both ends of the concave curved surface away from the target to prevent scratches and achieve a smooth R face.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a cutting tool with an arc-shaped concave curved surface is used to chamfer the corner portion, then the R face can be approximated to the aimed R face, but the blade portion may scratch the R face during cutting

Engineering Contradiction:

Improveapproximation accuracy of R faceVSAvoidscratching of R face

Core Design Contradiction:

Manufacturing precisionVSObject-affected harmful factors

Solution Approach 1:

The patent applies parameter changes by carefully selecting and controlling the curvature radius Ra of the concave curved surface on the blade portion. By setting Ra to be equal to or larger than the curvature radius Rb of the aimed R face, and by controlling the positioning distance a between the blade center and target center, the patent achieves both accurate approximation of the R face and prevention of scratching during the chamfering process

Inventive Principle:

Principle #35Parameter changes

Solution Approach 2:

The patent implements preliminary action by pre-calculating and pre-positioning the blade portion parameters before the actual cutting operation. The curvature radius Ra and positioning distance a are determined in advance based on the desired R face specifications, ensuring that the blade is properly configured before contact with the sputtering target, thus preventing scratching while achieving accurate R face formation

Inventive Principle:

Principle #10Preliminary action

2Object-affected harmful factors

If the curvature radius of the blade portion is increased to prevent scratching, then the R face can be protected, but the approximation accuracy to the aimed R face may deteriorate

Engineering Contradiction:

Improvescratching preventionVSAvoidapproximation accuracy of R face

Core Design Contradiction:

Object-affected harmful factorsVSManufacturing precision

Solution Approach 1:

The patent resolves this contradiction through precise parameter selection and control. By establishing the relationship that Ra should be equal to or larger than Rb, and by controlling the positioning distance a within specific ranges, the patent achieves optimal balance between scratching prevention and R face approximation accuracy. The parameters are carefully coordinated to ensure both protection and precision

Inventive Principle:

Principle #35Parameter changes

3Ease of manufacture

If conventional machining methods are used to chamfer the corner portion, then the processing is simpler, but the R face cannot be accurately approximated to the aimed R face

Engineering Contradiction:

Improveprocessing simplicityVSAvoidapproximation accuracy of R face

Core Design Contradiction:

Ease of manufactureVSManufacturing precision

Solution Approach 1:

The patent applies spheroidality by using a blade portion with an arc-shaped concave curved surface instead of conventional flat or simple geometric tool profiles. This curved blade geometry naturally conforms to the desired R face shape, enabling accurate approximation of the aimed R face while maintaining a relatively simple single-pass chamfering operation

Inventive Principle:

Principle #14Spheroidality (Curvature)

Solution Approach 2:

The patent achieves accurate R face approximation by carefully controlling key parameters including the curvature radius Ra of the blade, the positioning distance a between blade center and target center, and the cutting depth. These parameter optimizations enable precision machining without significantly complicating the manufacturing process

Inventive Principle:

Principle #35Parameter changes

Data Source

PatentUS10562112B2Method for processing sputtering target and method for manufacturing sputtering target product

Publication Date: 2020.02.18 SUMITOMO CHEM CO LTD

AI summary

Disclosed is a method for processing a sputtering target comprises: processing a sputtering target by rotating a cutting tool which has a blade portion with an arc-shaped concave curved surface on a cross section along the axis, around an axis thereof, to chamfer the target at a corner portion between a sputtering surface and a side surface in the sputtering target with an arc-shaped concave curved surface of a blade portion in such a manner that the corner portion is approximated to an arc-shaped aimed R face, wherein the sputtering target is chamfered at the corner portion in such a manner that a curvature radius Ra of the concave curved surface in the blade portion is equal to or more than a curvature radius Rb of the aimed R face on the cross section along the axis and that both ends of the concave curved surface in the blade portion are positioned away from the sputtering target.