Stacked Word Line Grouping for Semiconductor Memory Integration

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Solution Overview

Problem

As semiconductor memory devices strive to increase integration density, the number of stacked word lines required becomes cumbersome, complicating the manufacturing process and requiring significant changes in peripheral circuit design and internal structure to accommodate the increased number of lines for voltage distribution.

Innovation Solution

The semiconductor memory device integrates stacked word lines across multiple memory blocks within a group, allowing interconnection of word lines between blocks and isolating select lines, thereby reducing the overall number of lines needed for each memory block while maintaining or reducing the complexity of peripheral circuits.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Quantity of substance

If the number of stacked word lines is increased to increase integration density, then data storage capacity is improved, but the number of lines for voltage distribution increases and manufacturing complexity increases

Engineering Contradiction:
Improveintegration densityVSAvoidnumber of lines
Core Design Contradiction:
Quantity of substanceVSDevice complexity

Solution Approach 1:

The patent merges word lines across multiple memory blocks by defining a memory block group where first memory blocks and second memory blocks share common word lines. Specifically, word lines in the first memory blocks are electrically connected to corresponding word lines in the second memory blocks, allowing a reduced number of physical word lines to control memory cells across multiple blocks. This combining approach increases integration density without proportionally increasing the number of lines required.

Inventive Principle:
Principle #5Merging (Combining)

2Quantity of substance

If the number of stacked word lines is increased to increase integration density, then data storage capacity is improved, but peripheral circuit complexity increases

Engineering Contradiction:
Improveintegration densityVSAvoidperipheral circuit complexity
Core Design Contradiction:
Quantity of substanceVSDevice complexity

Solution Approach 1:

The patent implements multi-functionality in the peripheral circuits by designing voltage generation circuits that can generate voltages for multiple memory blocks simultaneously. The row decoder is configured to control word lines across first and second memory blocks using a reduced set of decoded signals. This universal approach allows peripheral circuits to serve multiple memory blocks without requiring separate dedicated circuits for each block, thereby reducing overall peripheral circuit complexity while maintaining high integration density.

Inventive Principle:
Principle #6Universality (Multi-functionality)

3Quantity of substance

If the number of stacked word lines is increased to increase integration density, then data storage capacity is improved, but manufacturing process difficulty increases

Engineering Contradiction:
Improveintegration densityVSAvoidmanufacturing process difficulty
Core Design Contradiction:
Quantity of substanceVSEase of manufacture

Solution Approach 1:

The patent segments the memory device into memory block groups containing first memory blocks and second memory blocks with different word line configurations. This segmentation allows for standardized manufacturing of each block type while achieving high overall integration through their combination. The segmented approach simplifies the manufacturing process by enabling modular production and assembly, rather than requiring complex monolithic structures with an excessive number of unique word lines.

Inventive Principle:
Principle #1Segmentation

Data Source

PatentUS8811082B2Semiconductor memory device
Publication Date: 2014.08.19 SK HYNIX INC
  • US8811082B2 patent drawing
  • US8811082B2 patent drawing
  • US8811082B2 patent drawing

AI summary

A semiconductor memory device includes word lines stacked over a substrate having a plurality of memory block regions, select lines arranged over the word lines, vertical channel layers formed to penetrate through the select lines and the word lines and extending to the substrate, and a charge trap layer disposed between the word lines and the vertical channel layers, wherein the stacked word lines are separated by memory block groups that each include two or more memory block regions.