Substrate Bevel Cleaning With Torque-Based Contact Detection
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Solution Overview
Problem
Existing substrate cleaning technologies face challenges in effectively cleaning the bevels of substrates due to wear and varying positional relationships between the cleaning tools and substrates, leading to incomplete cleaning.
Innovation Solution
A substrate cleaning apparatus equipped with a contact detection mechanism using a torque sensor to detect contact between the cleaning tool and the substrate, allowing precise movement and adjustment of the cleaning tool to ensure thorough cleaning, and a self-cleaning mechanism for maintaining tool effectiveness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the cleaning tool position is fixed relative to the substrate, then the device structure is simple, but cleaning quality deteriorates due to wear and positional variations
Solution Approach 1:
The cleaning tool is made movable along the substrate radial direction through a driving mechanism, allowing dynamic adjustment of the cleaning tool position relative to the substrate. This enables compensation for wear and positional variations, maintaining cleaning quality without requiring an overly complex fixed-position system
Solution Approach 2:
A detection mechanism detects the actual position relationship between the cleaning tool and substrate, providing feedback to the control system. The control system then adjusts the cleaning tool position via the driving mechanism to maintain optimal cleaning contact, resolving the contradiction between simple structure and high cleaning precision
2Reliability
If the cleaning tool moves closer to the substrate to ensure contact, then cleaning effectiveness improves, but the risk of excessive force or damage increases
Solution Approach 1:
The detection mechanism continuously monitors the contact state between the cleaning tool and substrate, providing real-time feedback to the control system. When contact is detected or excessive force is anticipated, the system automatically adjusts the cleaning tool position to maintain optimal contact pressure, ensuring cleaning effectiveness while preventing damage
Solution Approach 2:
The control system proactively adjusts the cleaning tool position based on detected trends or predetermined conditions before excessive force or damage can occur. This preliminary anti-action prevents harmful effects while maintaining reliable cleaning contact
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Ensures reliable and efficient cleaning of substrate bevels by accurately detecting contact and adjusting tool position, even with wear, and maintains cleaning tool effectiveness through self-cleaning, thereby improving cleaning quality.
Implementation Method 1
a contact detection means that detects contact between the cleaning tool and the bevel of the substrate
Data Source
AI summary
Provided is a substrate cleaning apparatus including: a substrate holding and rotating mechanism that holds and rotates a substrate; a cleaning tool that cleans a bevel of the substrate; a contact detection means that detects contact between the cleaning tool and the bevel of the substrate; and a cleaning tool moving mechanism that moves the cleaning tool toward the bevel of the substrate until the contact is detected in a state where the substrate is being rotated.