Substrate Cleaning Device Interference Prevention
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Solution Overview
Problem
Current substrate cleaning methods require complex setting operations for multiple cleaners, leading to interference issues and reduced throughput, while striving to achieve higher cleanliness of the substrate's back surface for finer pattern formation.
Innovation Solution
A substrate cleaning device with a rotation holder, first and second cleaners, and a controller that manages their movement paths to prevent interference by determining when the first cleaner has moved out of an interference region, allowing the second cleaner to start moving from the outer periphery to the center, ensuring simultaneous operation without complex setting operations.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If multiple cleaning brushes are used simultaneously to clean the substrate, then the cleanliness of the substrate back surface is improved, but the complexity of operation increases due to interference between brushes
Solution Approach 1:
The system pre-calculates and stores position information indicating when the first cleaner exits the interference region before cleaning operations begin. This preliminary computation enables the controller to automatically determine optimal timing for the second cleaner's activation, eliminating the need for complex real-time coordination and manual operation patterns.
2Manufacturing precision
If multiple cleaning brushes are used simultaneously to clean the substrate, then the cleanliness of the substrate back surface is improved, but the throughput is reduced due to waiting periods
Solution Approach 1:
The controller uses stored position information as feedback to determine when the first cleaner has exited the interference region. Based on this feedback, the controller automatically activates the second cleaner at the optimal moment, ensuring continuous cleaning operation without waiting periods and maintaining high throughput while achieving improved cleanliness.
3Reliability
If operation patterns are pre-set by user to prevent interference between cleaning brushes, then interference is avoided, but the setting operation becomes complicated and time-consuming
Solution Approach 1:
The system performs self-service by automatically calculating and storing position information that defines when cleaners exit interference regions. The controller uses this stored information to autonomously coordinate cleaner operations without requiring user intervention for pattern setting, thereby maintaining reliable interference prevention while greatly simplifying operation.
4Reliability
If one cleaning brush waits while another cleans the substrate, then interference between brushes is avoided, but the cleaning efficiency and throughput are reduced
Solution Approach 1:
The system dynamically coordinates the operation of multiple cleaners based on real-time position information. Rather than static waiting periods, the controller activates the second cleaner at the precise moment when the first cleaner exits the interference region, enabling both cleaners to operate efficiently in sequence without interference and maximizing cleaning throughput.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances substrate cleanliness without reducing throughput, as the second cleaner can start moving sooner, reducing the cleaning time and preventing interference between the cleaners, thus improving overall cleaning efficiency.
Implementation Method 1
a rotation holder that holds and rotates a substrate
Implementation Method 2
a first mover that moves the first cleaner along a first path that extends to pass through a center of the substrate and an outer periphery of the substrate
Implementation Method 3
a second mover that moves the second cleaner along a second path that extends to pass through the center of the substrate and the outer periphery of the substrate
Data Source
AI summary
A rotating substrate is cleaned by a polishing head and a cleaning brush. A first trajectory is formed by movement of the polishing head along a first path. A second trajectory is formed by movement of the cleaning brush along a second path. A region in which the first and second paths overlap with each other is defined as an interference region. The polishing head moves from a center towards an outer peripheral end of the substrate, and it is determined whether the polishing head has moved out of the interference region. At a time point at which it is determined that the polishing head has moved out of the interference region, the cleaning brush starts moving from the outer peripheral end towards the center of the substrate.