Substrate Treatment Exhaust Pressure Control With External Valve Members
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The existing substrate treating apparatuses face challenges in precisely adjusting the inner pressure of the treating space and efficiently exhausting process by-products, leading to increased structural complexity and reduced substrate treating efficiency.
Innovation Solution
The substrate treating apparatus incorporates a pressure adjusting unit with an opening/closing member, a lifting/lowering member, and an elastic member to adjust the exhaust pressure, allowing for precise control of the inner pressure and efficient exhaust of by-products.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If multiple driving members are installed to precisely adjust the exhaust line opening degree, then the inner pressure adjustment precision is improved, but the structural complexity increases
Solution Approach 1:
The patent combines multiple driving members into a single integrated driving member that can simultaneously control multiple opening/closing members. This merging approach maintains the precision of pressure adjustment while reducing the number of separate components and simplifying the overall structure.
Solution Approach 2:
The single driving member is designed to perform multiple functions by controlling several opening/closing members simultaneously. This multi-functional design allows one component to replace what would traditionally require multiple separate components, thereby reducing structural complexity while maintaining adjustment precision.
2Measurement precision
If opening/closing members are installed inside the exhaust line to adjust the opening degree, then the inner pressure control is improved, but the maintenance frequency increases due to particles and process byproducts
Solution Approach 1:
The patent extracts the opening/closing members from the interior of the exhaust line and positions them at the exhaust line opening. This relocation removes the components from the particle-laden environment inside the exhaust line, thereby reducing contamination and maintenance requirements while preserving pressure control functionality.
Solution Approach 2:
The opening/closing members act as an intermediary mechanism positioned at the exhaust line opening rather than inside it. This intermediary positioning allows them to control exhaust flow and pressure without being directly exposed to the harmful particles and byproducts that accumulate inside the exhaust line.
3Productivity
If a complex system with multiple driving members is used to control the exhaust line, then the substrate treating efficiency is improved through precise pressure adjustment, but the device complexity increases
Solution Approach 1:
The patent merges multiple driving members into a single driving member that controls multiple opening/closing members. This consolidation maintains the precise pressure adjustment capability needed for high substrate treating efficiency while reducing device complexity through component integration.
Solution Approach 2:
The system employs dynamic control where a single driving member can adjust the opening degrees of multiple opening/closing members in a coordinated manner. This dynamic adjustment capability allows precise pressure control for optimal substrate treating efficiency without requiring multiple independent driving mechanisms.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively adjusts the inner pressure of the treating space, efficiently exhausts process by-products, and minimizes structural complexity, thereby enhancing the substrate treating efficiency.
Implementation Method 1
an elastic member for providing a restoring force to the lifting/lowering member
Implementation Method 2
A plasma refers to an ionized gas state composed of ions, radicals, and electrons. The plasma is produced by a very high temperatures, a strong electric field, or a high frequency electromagnetic field (RF electromagnetic field).
Data Source
AI summary
The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a housing having a treating space for treating a substrate; a support unit configured to support the substrate at the treating space; and a plasma source for generating a plasma from a process gas supplied into the treating space; an exhaust line connecting to the housing and exhausting an atmosphere of the treating space; and a pressure adjusting unit positioned between the support unit and the exhaust line and configured to adjust an exhaust pressure exhausted from the exhaust line, and wherein the pressure adjusting unit includes: an opening/closing member for opening and closing the exhaust line; a lifting/lowering member for moving the opening/closing member in an up/down direction; and an elastic member for providing a restoring force to the lifting/lowering member.