Planar Substrate Holder With Flow Guidance for Uniform Wet Treatment

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Solution Overview

Problem

Existing non-immersive wet-chemical treatment systems for planar substrates face challenges in achieving uniform surface treatment due to the formation of eddies when liquid flows onto the substrate, which affects the consistency of the treatment process.

Innovation Solution

The device features a support structure with a movable central longitudinal section of the strip that engages the substrate's surface over its entire length, combined with upper and lower flow guidance parts that direct liquid flow to minimize eddies and ensure uniform treatment, using a flooding device with a vessel and orifice system to maintain a consistent liquid flow.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If liquid is directed onto the substrate in existing non-immersive wet-chemical treatment systems, then the substrate surface is treated, but eddies form in the liquid flow causing non-uniform treatment

Engineering Contradiction:
Improveuniformity of surface treatmentVSAvoideddy formation in liquid flow
Core Design Contradiction:
Manufacturing precisionVSObject-generated harmful factors

Solution Approach 1:

The patent introduces an intermediary flow guidance structure positioned between the liquid source and the substrate. This intermediary component shapes and directs the liquid flow to prevent eddy formation while ensuring uniform distribution across the substrate surface, thereby resolving the contradiction between achieving treatment and avoiding harmful flow patterns

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The patent modifies the physical parameters of the liquid flow by controlling its velocity profile and distribution pattern through specially designed flow guidance elements. By changing flow parameters such as velocity uniformity and directional consistency, the system achieves uniform substrate treatment without generating eddies

Inventive Principle:
Principle #35Parameter changes

2Area of stationary object

If the liquid flow is increased to improve treatment coverage, then more of the substrate surface is treated, but turbulence increases reducing treatment uniformity

Engineering Contradiction:
Improvetreated surface areaVSAvoiduniformity of treatment
Core Design Contradiction:
Area of stationary objectVSManufacturing precision

Solution Approach 1:

The patent divides the liquid flow into multiple segmented streams or zones using flow guidance structures. Each segment is controlled independently to maintain uniform velocity and distribution, allowing increased overall coverage while preserving local uniformity and preventing turbulence-induced eddies

Inventive Principle:
Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration ensures a uniform, laminar film flow across the substrate's surface, reducing turbulence and enhancing the uniformity of the treatment process up to the edge of the substrate, thereby improving the overall treatment efficiency.

Implementation Method 1

This configuration ensures a uniform, laminar film flow across the substrate's surface, reducing turbulence and enhancing the uniformity of the treatment process

Methodology Applied
Scientific EffectLaminar flow: Laminar Flow

Implementation Method 2

The device features a support structure with a movable central longitudinal section of the strip that engages the substrate's surface over its entire length, combined with upper and lower flow guidance parts that direct liquid flow to minimize eddies and ensure uniform treatment

Methodology Applied
Scientific EffectTurbulence reduction: Turbulence

Data Source

PatentEP4332277A1Apparatus and method for non-immersive wet-chemical treatment of a planar substrate and device for holding the substrate
Publication Date: 2024.03.06 ATOTECH DEUT GMBH & CO KG
  • EP4332277A1 patent drawingFigure 1~2
  • EP4332277A1 patent drawingFigure 3~4
  • EP4332277A1 patent drawingFigure 5~6

AI summary

A device for holding a planar substrate (1) in an apparatus for non-immersive wet-chemical treatment of the substrate (1) comprises a support structure (34). The support structure (34) comprises at least one part (36a,b) for engaging a support such as to suspend the support structure (34) in the apparatus. The device comprises at least one clamping device, supported by the support structure (34), for holding the substrate (1) in a plane; and at least a first upper flow guidance part (37), arranged on one side of the plane and having an inward-facing surface (44) facing inwards and an outward-facing surface facing outwards with respect to the plane. The outward-facing surface comprises an upper outward-facing surface section (46), wettable by a stream of liquid directed onto the upper outward-facing surface section (46), and a lower outward-facing surface section (47), extending from a transition between at least a central part of the upper outward-facing surface section (46) and the lower outward-facing surface section (47) to a lower edge (49). A strip (45) of the inward-facing surface extends longitudinally along the lower edge (49) and transversely up to the lower edge (49). At least a central longitudinal section of the strip (45) is movable into engagement with a major surface of the substrate (1) over an entire length of that section.