Substrate Holder Recess Absorbs Lid Pressure to Stop Leakage
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Solution Overview
Problem
Gas leakage in multiple reactor apparatuses used in semiconductor manufacturing leads to process disruptions and equipment degradation due to deformation of the outer chamber's top lid, causing unstable contact between reactor walls and substrate holders.
Innovation Solution
A substrate holder with a stepped portion and recess region, allowing for elastic behavior when pressure is applied, which forms a buffer to absorb pressure and prevent gas leakage, and optionally includes props with a lower thermal expansion coefficient to maintain structural integrity at high temperatures.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If multiple reactor apparatuses are used to increase throughput, then productivity is improved, but gas leakage occurs due to top lid deformation
Solution Approach 1:
The substrate holder incorporates a recess region that acts as a buffer to absorb pressure from the top lid before it can cause deformation and gas leakage. This preemptive cushioning structure prevents the harmful effects of pressure accumulation while maintaining the multiple reactor configuration for high throughput production
2Strength
If the top lid is made heavier to strengthen the outer chamber, then structural strength is improved, but deformation of the outer chamber increases
Solution Approach 1:
The recess region in the substrate holder serves as a buffer that absorbs the pressure from the heavy top lid before it can deform the outer chamber. This allows the use of a stronger, heavier top lid to maintain structural integrity without causing the deformation that would lead to gas leakage
Solution Approach 2:
The recess region acts as an intermediary buffer zone between the heavy top lid and the outer chamber wall. It mediates the pressure transmission, allowing the top lid to be sufficiently heavy for strength while preventing the deformation that would compromise the outer chamber shape
3Stability of the object's composition
If the substrate holder is made rigid to maintain contact stability, then contact stability is improved, but adaptability to pressure variations decreases
Solution Approach 1:
The substrate holder employs local quality differentiation: the majority of the structure maintains rigidity for stable contact, while the recess region provides localized flexibility to adapt to pressure variations. This allows the holder to be both stable and adaptable simultaneously
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Significantly reduces gas leakage rates, maintaining process stability at various temperatures and preventing equipment degradation, ensuring consistent thin film deposition quality.
Implementation Method 1
the contact region has an elastic behavior when pressure is applied thereto from the reactor wall during the face-sealing contact
Implementation Method 2
props with a lower thermal expansion coefficient to maintain structural integrity at high temperatures
Data Source
AI summary
Disclosed are a substrate holder and a semiconductor manufacturing apparatus including the substrate holder. The substrate holder provides a reaction region by making face-sealing contact with a reactor wall. The substrate holder has an elastic behavior when pressure is applied thereto while the substrate holder makes face-sealing contact with the reactor wall. The semiconductor manufacturing apparatus includes the substrate holder and a gas supply unit configured to supply gas to the reaction region provided by the reactor wall and the substrate holder.