Substrate Immersion Bath Switching to Cut Processing Liquid Use
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Solution Overview
Problem
Single substrate processing type substrate processing apparatuses face challenges in reducing processing liquid consumption, especially when long processing times are required.
Innovation Solution
A substrate processing apparatus and method that includes a substrate holding portion, immersion bath, processing liquid supplying portion, and moving mechanism, allowing for switching between non-immersion and immersion states, and utilizing a brush for cleaning and a processing liquid cup for overflow, to optimize liquid use.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Duration of action of moving object
If a processing liquid is continuously supplied to the substrate in a single substrate processing type apparatus, then the substrate can be processed for a long time, but the consumption amount of the processing liquid cannot be reduced
Solution Approach 1:
The apparatus alternates between immersion processing and non-immersion states, periodically submerging the substrate in the processing liquid only when needed for actual processing, rather than continuously supplying liquid during the entire processing cycle
Solution Approach 2:
The system dynamically adjusts the substrate position between immersed and non-immersed states based on processing requirements, allowing the substrate to be moved in and out of the processing liquid as needed
2Quantity of substance
If a single substrate processing type apparatus is used instead of batch type, then the apparatus can be downsized and processing liquid consumption can be reduced, but processing liquid consumption cannot be reduced much when long processing is required
Solution Approach 1:
The system implements periodic immersion where the substrate is submerged in processing liquid only during necessary processing intervals, alternating between immersion and non-immersion states to minimize liquid consumption during long processing cycles
Solution Approach 2:
The substrate is extracted from the processing liquid when processing is not needed, removing it from the liquid environment to eliminate continuous liquid consumption while maintaining processing capability
Data Source
AI summary
A substrate processing apparatus includes a substrate holding portion, an immersion bath, a first supplying portion, and a moving mechanism. The substrate holding portion holds and rotates a substrate. The immersion bath stores a processing liquid, accommodates the substrate, and immerses the substrate in the processing liquid. The first supplying portion supplies the processing liquid to the immersion bath. The moving mechanism relatively moves the substrate holding portion and the immersion bath. The moving mechanism switches a state of the substrate between a non-immersion state in which the substrate is located outside the immersion bath and an immersion state in which the substrate is located inside the immersion bath and immersed in the processing liquid by moving the substrate holding portion or the immersion bath.