Substrate Impurity Recovery Using Gas-Mist Liquid Collection

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Solution Overview

Problem

Automated recovery of impurities from hydrophilic semiconductor substrates is challenging due to the need for manual wiping of recovery liquids, which hinders efficient and accurate quantitative analysis.

Innovation Solution

An impurity recovery device that uses sprayers to spray a recovery liquid and dry gas mist onto the substrate, combined with a rotating recovery portion to collect the liquid, followed by a series of cleaning and drying steps, allowing for automated impurity collection and analysis regardless of substrate hydrophobicity.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Extent of automation

If manual wiping is used for hydrophilic substrates, then impurity recovery can be performed, but automation is difficult and productivity is reduced

Engineering Contradiction:
Improveautomation of impurity recoveryVSAvoidefficiency of impurity recovery
Core Design Contradiction:
Extent of automationVSProductivity

Solution Approach 1:

The patent uses a gas blower to blow gas along the surface of the substrate, carrying the recovery liquid from the liquid introduction unit to the recovery portion. This pneumatic transport mechanism enables automated recovery of impurities from hydrophilic substrates without manual wiping, resolving the contradiction between automation and productivity.

Inventive Principle:
Principle #29Pneumatics and hydraulics

2Ease of operation

If recovery liquid is sprayed onto substrate, then automated processing is enabled, but liquid distribution control becomes challenging

Engineering Contradiction:
Improveautomated liquid applicationVSAvoidliquid distribution uniformity
Core Design Contradiction:
Ease of operationVSManufacturing precision

Solution Approach 1:

The gas blown along the substrate surface acts as an intermediary carrier, transporting the recovery liquid from the introduction unit to the recovery portion. This intermediary gas flow ensures controlled and uniform liquid distribution across the substrate surface, enabling automated processing while maintaining precision.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The patent replaces manual wiping mechanics with a gas-driven liquid transport system. The gas blower creates airflow that carries the recovery liquid across the substrate surface, substituting mechanical contact with aerodynamic transport for automated and precise liquid distribution.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables automated and efficient recovery of impurities from both hydrophobic and hydrophilic substrates, improving the accuracy of subsequent quantitative analysis by preventing manual intervention and ensuring thorough impurity collection.

Implementation Method 1

sprayers that spray a recovery liquid and a dry gas mist toward a substrate

Methodology Applied
Scientific EffectSpray: Spray

Implementation Method 2

a recovery portion that rotates while being in contact with an outer circumference of the substrate and that recovers the recovery liquid

Methodology Applied
Scientific EffectAbsorption: Absorption (physical)

Data Source

PatentUS12472533B2Impurity recovery device and impurity recovery method
Publication Date: 2025.11.18 KIOXIA CORP
  • US12472533B2 patent drawing
  • US12472533B2 patent drawing
  • US12472533B2 patent drawing

AI summary

An impurity recovery device according to the present embodiment may recover impurities present on a surface of a substrate. The substrate may be placed on a stage. A sprayer may spray a recovery liquid toward the substrate along a direction from a side of a central part of the substrate to a side of the end part of the substrate. A recovery portion may recover the recovery liquid from the end part of the substrate.