Cleaning Using Tools TRIZ Cases

An expandable groove and actuator let the CMP cleaning support adapt to wafer thickness, reducing tilt and slippage during scrubbing.

An integrated cleaning cloth in the cap wipes the ferrule face during cap removal, avoiding separate tools and contaminated optical connectors.

A motorized winch and sliding guide move the slag removal machine across workbench plates, cutting manual effort and keeping the bench clear.

A single pump and flow-regulating valves balance multiple additive manufacturing fluid paths to maintain uniform flow despite viscosity shifts.

Surfactant-washed twisted chemical-fiber string cuts residual oil to protect optical connector end faces and reduce light loss.

Sealed enclosure and airtight containers let cleaned parts move through automated warehouse storage without losing cleanliness or expanding cleanroom space.

A sloped protrusion rotates and scrapes the electroplating seal apex to remove Sn or Sn/Ag residue and prevent plate-up contamination.

Direction-based liquid delivery lets escalator handrails be wet cleaned, dried, and UV sterilized without stopping passenger service.

Gas-liquid atomizer nozzles help CMP cleaning fluids shed dissolved oxygen, reducing corrosion and galvanic coupling on metal layers.

Gas mist and a rotating recovery portion automate impurity collection from hydrophilic substrates for more accurate quantitative analysis.