Substrate Nozzle Exhaust Layout for Unified Flow Control
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Solution Overview
Problem
Existing substrate processing apparatuses face difficulties in controlling the overall exhaust amount due to separate management of gas exhausted from the processing chamber and waiting pod, leading to challenges in maintaining a comfortable working environment and efficient operation.
Innovation Solution
A substrate processing apparatus is designed with a nozzle that supplies processing liquid to a substrate, a mover to move the nozzle between supply and waiting positions, a nozzle container, a first exhaust flow path guiding gas from the processing space to an exhaust device, and a second exhaust flow path guiding gas from the nozzle container to the first exhaust flow path, allowing for unified control of the exhaust amount.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If separate exhaust flow paths are provided for the processing chamber and waiting pod, then each space can be exhausted independently, but it becomes difficult to control the overall exhaust amount of the development device
Solution Approach 1:
The patent merges the exhaust systems by providing a common exhaust flow path that receives exhaust from both the processing chamber and waiting pod. The first exhaust flow path guides gas from the processing chamber to the exhaust device, while the second exhaust flow path guides gas from the waiting pod to join the first exhaust flow path, enabling unified control of the overall exhaust amount through a single exhaust device.
2Ease of operation
If multiple independent exhaust devices are provided for different spaces, then each space can be managed separately, but the device size increases
Solution Approach 1:
The patent combines multiple exhaust functions into a single exhaust device. The common exhaust flow path integrates exhaust from the processing chamber and waiting pod, eliminating the need for multiple independent exhaust devices and thereby reducing the overall device size while maintaining separate management capability through the modular flow path design.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enables easy regulation of the overall exhaust amount, reduces the size of the device by eliminating the need for independent exhaust devices, and effectively suppresses atmosphere leakage, improving operational efficiency and environmental comfort.
Implementation Method 1
a first exhaust flow path that guides a gas in a processing space in which a processing liquid is supplied to a substrate to an exhaust device
Implementation Method 2
a second exhaust flow path that guides a gas in the nozzle container to the first exhaust flow path
Data Source
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AI summary
A substrate processing apparatus includes a nozzle that supplies a processing liquid to a substrate, a mover that moves the nozzle between a supply position above a substrate and a waiting position outward of the substrate, a nozzle container that is located at the waiting position and contains the nozzle, a first exhaust flow path that guides a gas in a processing space in which a processing liquid is supplied to a substrate to an exhaust device, and a second exhaust flow path that guides a gas in the nozzle container to the first exhaust flow path.