Substrate Rear Surface Cleaning Brush Mechanism
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing substrate processing methods face challenges in effectively removing foreign substances from the rear surface of substrates, which can affect the accuracy and quality of subsequent processing steps, such as exposure processing in the exposure apparatus.
Innovation Solution
A substrate processing apparatus and method that includes a film processing unit for forming a resist film on the front surface, a film removing unit for removing the rear surface film using a processing liquid, and a foreign substance removing unit that moves a brush along the rear surface to remove foreign substances, ensuring thorough removal of contaminants.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a brush is moved along the rear surface to remove foreign substances, then the removal effectiveness is improved, but the device complexity increases
Solution Approach 1:
The processing unit is divided into three distinct functional modules: a film forming unit for forming resist films on the front surface, a film removing unit for removing rear surface films using processing liquids, and a foreign substance removing unit with a brush for removing foreign substances from the rear surface. This segmentation allows each module to perform its specific function independently, improving foreign substance removal effectiveness while maintaining manageable device complexity through modular design.
Solution Approach 2:
The processing unit is designed as a multi-functional system that can perform multiple operations on the substrate: resist film formation on the front surface, rear surface film removal, and foreign substance removal from the rear surface. By integrating these diverse functions into a single processing unit, the system achieves comprehensive substrate treatment capability without requiring multiple separate devices, thus improving removal effectiveness while controlling overall device complexity.
2Manufacturing precision
If multiple processing units are integrated, then the substrate processing quality is improved, but the device complexity increases
Solution Approach 1:
The processing unit is segmented into three specialized modules, each responsible for a specific processing task: film formation, film removal, and foreign substance removal. This segmentation enables each module to be optimized for its specific function, thereby improving overall substrate processing quality while keeping the complexity of each individual module manageable.
Solution Approach 2:
Three distinct processing functions (film formation on front surface, film removal from rear surface, and foreign substance removal from rear surface) are merged into a single integrated processing unit. This consolidation allows the system to deliver comprehensive substrate treatment in one unit, improving manufacturing precision by ensuring consistent processing quality across all operations while avoiding the need for multiple separate devices.
3Reliability
If the brush contacts the rear surface continuously, then the foreign substance removal is improved, but the risk of substrate damage increases
Solution Approach 1:
The foreign substance removing unit uses a brush as an intermediary tool to remove foreign substances from the rear surface. The brush acts as a mediator between the substrate and the removal mechanism, providing gentle mechanical action that can effectively remove foreign substances while minimizing direct harsh contact that could damage the substrate. This intermediary approach improves removal thoroughness while reducing substrate damage risk.
Solution Approach 2:
The system controls the contact parameters between the brush and the rear surface, such as contact pressure, brush speed, and brush material properties. By optimizing these parameters, the system achieves effective foreign substance removal while maintaining contact forces below the threshold that would cause substrate damage, thus improving removal thoroughness while controlling damage risk.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables efficient removal of foreign substances from the rear surface, improving the flatness and reducing the influence of these substances on exposure processing, thereby enhancing the overall substrate processing quality.
Implementation Method 1
a film removing unit configured to supply, to a rear surface film formed on a rear surface of the substrate opposite to the front surface, a second processing liquid configured to remove the rear surface film
Implementation Method 2
a foreign substance removing unit configured to move a brush along the rear surface of the substrate, while keeping the brush in contact with the rear surface of the substrate
Implementation Method 3
a foreign substance removing unit configured to move a brush along the rear surface of the substrate, while keeping the brush in contact with the rear surface of the substrate after being processed by the film removing unit
Data Source
AI summary
A substrate processing apparatus includes a film processing unit configured to perform a preset processing including formation of a resist film on a front surface of a substrate; and a carry-in/out unit configured to perform a carry-in/carry-out of the substrate into/from the film processing unit. The film processing unit includes a resist film forming unit configured to form the resist film on the front surface of the substrate; a film removing unit configured to supply, to a rear surface film formed on a rear surface of the substrate opposite to the front surface, a processing liquid configured to remove the rear surface film; and a foreign substance removing unit configured to move a brush along the rear surface of the substrate, while keeping the brush in contact with the rear surface of the substrate after being processed by the film removing unit.