Substrate Transfer Rail Layout for Faster, Cleaner Handling
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Solution Overview
Problem
The existing transfer apparatuses in substrate processing systems face challenges in improving substrate transfer rates and preventing particle adherence to the substrates during processing.
Innovation Solution
The proposed transfer apparatus includes an attachment member with multiple traveling and fixed rails, an elevating rail, and a transfer robot. This configuration allows for efficient vertical and horizontal movement of substrates, enhancing transfer rates while ensuring clean air supply to prevent particle adherence.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If the horizontal motion assembly is installed directly above the substrate held by the transfer apparatus, then the stiffness of the transfer apparatus is improved and the horizontal motion velocity of the substrate is increased, but it becomes difficult to supply clean air to the surface to be processed, resulting in particle adherence
Solution Approach 1:
The horizontal motion assembly is relocated from a vertical position (directly above the substrate) to a horizontal position (at the same level as the substrate). This dimensional change allows the assembly to be positioned at the end of the substrate transfer path rather than over the processing area, maintaining structural stiffness while enabling clean air supply to the substrate surface from above without obstruction.
2Speed
If the horizontal motion assembly is installed directly above the substrate, then the horizontal motion velocity of the substrate is increased, but the transfer rate of substrates cannot be improved and particle suppression is compromised
Solution Approach 1:
By repositioning the horizontal motion assembly to operate horizontally at substrate level rather than vertically above it, the system achieves both high horizontal motion velocity and improved substrate transfer rate. The relocated assembly no longer obstructs the vertical clean air flow path, enabling simultaneous optimization of speed, productivity, and particle suppression.
Data Source
AI summary
To improve a transfer rate of substrates and suppress particles from adhering to the surfaces to be processed of the substrates.A transfer apparatus configured to transfer a substrate in an elevating direction and a traveling direction perpendicular to the elevating direction includes an attachment member 710-1. The attachment member 710-1 is fixed to a side surface of a module frame 402A for installing a plating module including a substrate loading/unloading port 404-1 to 404-8. The attachment member 710-1 includes a plurality of traveling rails 714-1 to 714-3 extending in a traveling direction disposed on both sides of the substrate loading/unloading port 404-1 to 404-8 in the elevating direction. The transfer apparatus includes an elevating rail 716 extending in the elevating direction across the plurality of traveling rails 714-1 to 714-3 and being movable along the plurality of traveling rails 714-1 to 714-3, and a transfer robot 718 configured to be movable vertically along the elevating rail 716 and including a hand for holding a substrate.