Substrate Transfer Layout for Single-Wafer Extraction From Batch Processing
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Solution Overview
Problem
Current substrate treating apparatus face challenges in allowing a horizontal substrate transporting robot to easily extract one substrate from a plurality treated collectively due to narrow gaps between substrates, leading to complex constructions and inefficiencies.
Innovation Solution
A substrate treating apparatus with a vertical substrate holder and transporting robot that divides substrate groups, turns their posture from vertical to horizontal, and uses chucks with holding and passing grooves to widen the gap between substrates, enabling easy extraction by a horizontal robot.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If substrates are arranged at a pitch of 5mm in the batch processing unit, then treatment efficiency is improved, but the gap between adjacent substrates becomes too narrow for the horizontal substrate transporting robot to extract individual substrates
Solution Approach 1:
The substrate holder changes the arrangement dimension from horizontal to vertical, allowing substrates to be stacked vertically while maintaining the 5mm pitch for high throughput. The robot extracts substrates from the vertical stack by pulling them out, which provides sufficient space for the robot's hand to access and remove individual substrates without requiring increased horizontal spacing.
Solution Approach 2:
The substrate processing is segmented into two distinct operations: (1) batch treatment of multiple substrates simultaneously in the vertical holder, and (2) individual substrate extraction by the robot. This segmentation allows the system to maintain high density arrangement for treatment while providing easy access for individual extraction, resolving the contradiction between productivity and ease of operation.
2Ease of operation
If the substrate holder moves upward and downward to enable robot extraction, then substrate accessibility is improved, but the apparatus construction becomes complex
Solution Approach 1:
Instead of moving the substrate holder vertically to enable extraction, the system inverts the approach by keeping the holder stationary and having the robot perform the extraction action. The robot's hand is designed to access and pull substrates horizontally from the vertical stack, eliminating the need for complex vertical movement mechanisms while maintaining easy accessibility.
Solution Approach 2:
The substrate holder is designed with a structure that allows substrates to be easily extracted by the robot without requiring the holder itself to move. The holder provides stable positioning during treatment, and the extraction mechanism is simplified by separating the holding function from the movement function, reducing overall system complexity.
Data Source
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Figure 3A~3F
AI summary
Disclosed is a substrate treating apparatus including a substrate holder configured to hold a treatment substrate group, a second transport mechanism configured to pull out and transport a divided substrate group from the treatment substrate group held by the substrate holder, an underwater posture turning unit configured to turn a posture of the divided substrate group, transported by the second transport mechanism, from vertical to horizontal collectively, a center robot configured to take one substrate from the divided substrate group, whose posture is turned to horizontal, and to transport the one substrate to a single-wafer processing unit, a relative lifting and lowering unit configured to move the substrate holder and the second transport mechanism upward and downward relatively, and an alignment direction relative moving unit configured to move the substrate holder and the second transport mechanism relatively horizontally in an alignment direction where the treatment substrate group is aligned. The second transport mechanism includes one-paired chucks having holding grooves and passing grooves arranged one by one alternately.