Supercritical Substrate Drying Chamber With Fixed Support Layout

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Solution Overview

Problem

Existing substrate drying technologies using supercritical fluids face challenges in efficiently replacing liquid films on substrates without causing surface tension-induced irregularity pattern collapse and require larger apparatus sizes due to moving supporting bodies and cover mechanisms.

Innovation Solution

A substrate processing apparatus with a fixed supporting body within the drying chamber and a cover body that is not moved back and forth, allowing for a compact design and efficient fluid flow management, using a supercritical fluid to replace the liquid film and suppress surface tension effects.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of operation

If a moving supporting body and movable cover mechanism are used to carry substrates in/out of the drying chamber, then substrate transfer capability is improved, but apparatus size and structural complexity increase

Engineering Contradiction:

Improvesubstrate transfer capabilityVSAvoidapparatus size and structure

Core Design Contradiction:

Ease of operationVSDevice complexity

Solution Approach 1:

Instead of moving the supporting body in and out of the drying chamber, the invention inverts the approach by making the transfer block movable while keeping the supporting body fixed inside the chamber. The transfer block carries the substrate into the chamber through the opening, and the substrate is then transferred to the fixed supporting body for drying. This inversion eliminates the need for a movable supporting body and reduces apparatus complexity.

Inventive Principle:

Principle #13The other way round (Inversion)

Solution Approach 2:

The invention segments the substrate handling function into two separate components: a movable transfer block for carrying substrates in/out of the chamber, and a fixed supporting body for holding substrates during drying. This segmentation allows each component to be optimized independently, with the transfer block providing mobility and the supporting body providing stability, thereby reducing overall apparatus complexity.

Inventive Principle:

Principle #1Segmentation

2Ease of operation

If the cover body is moved back and forth for substrate carry-in/out, then substrate access is improved, but vibration and maintenance complexity increase

Engineering Contradiction:

Improvesubstrate accessVSAvoidvibration

Core Design Contradiction:

Ease of operationVSObject-affected harmful factors

Solution Approach 1:

Instead of moving the cover body to enable substrate access, the invention inverts the approach by making the transfer block movable while keeping the cover body fixed. The transfer block carries substrates through the opening in the fixed cover body, eliminating vibrations associated with moving the cover structure while maintaining full substrate access capability.

Inventive Principle:

Principle #13The other way round (Inversion)

3Volume of moving object

If a fixed supporting body is used in the drying chamber, then apparatus size is reduced, but substrate transfer mechanism complexity increases

Engineering Contradiction:

Improveapparatus sizeVSAvoidtransfer mechanism

Core Design Contradiction:

Volume of moving objectVSDevice complexity

Solution Approach 1:

The invention merges the substrate transfer and positioning functions into a single integrated transfer block that carries substrates into the chamber and interfaces directly with the fixed supporting body. This consolidation eliminates the need for separate transfer mechanisms and reduces overall apparatus size while maintaining transfer capability.

Inventive Principle:

Principle #5Merging (Combining)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The apparatus effectively dries substrates by suppressing surface tension-induced irregularity pattern collapse and allows for a scaled-down design, reducing vibration and maintenance complexity while maintaining efficient processing capabilities.

Implementation Method 1

a drying unit configured to replace the liquid film with a supercritical fluid to dry the substrate

Methodology Applied

Scientific EffectSupercritical fluid: Supercritical Fluid

Implementation Method 2

suppressing surface tension-induced irregularity pattern collapse

Methodology Applied

Scientific EffectSurface tension: Surface Tension

Data Source

PatentUS12057326B2Substrate processing apparatus and substrate processing method

Publication Date: 2024.08.06 TOKYO ELECTRON LTD

AI summary

A substrate processing apparatus includes a transfer block in which a transfer device configured to transfer a substrate is placed, and a processing block provided adjacent to the transfer block. The processing block includes a liquid film forming unit configured to form a liquid film on a top surface of the substrate which is held horizontally, and a drying unit configured to replace the liquid film with a supercritical fluid to dry the substrate. The drying unit includes a pressure vessel having therein a drying chamber for the substrate, a cover body configured to close an opening of the drying chamber, and a supporting body configured to support the substrate horizontally in the drying chamber. The supporting body is fixed to the drying chamber. The transfer device advances into the drying chamber through the opening of the drying chamber while holding horizontally the substrate having the liquid film thereon.