Superstrate Projections for Planarization Separation

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Solution Overview

Problem

Current planarization techniques in semiconductor fabrication face defects due to separation issues between the superstrate and dispense material on substrates, hindering whole wafer processing.

Innovation Solution

A superstrate design with a body fitting within a projected square, featuring projections that extend into an open area, allowing for enhanced crack propagation and separation from the substrate by applying force on these projections, facilitating efficient planarization and processing.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a superstrate is used for planarization, then planarization quality is improved, but separation defects occur between the superstrate and dispense material

Engineering Contradiction:
Improveplanarization qualityVSAvoidseparation defect rate
Core Design Contradiction:
Manufacturing precisionVSReliability

Solution Approach 1:

The superstrate is segmented into a body portion and a projection portion, where the projection extends into the open area to provide a controlled separation interface. This segmentation allows the main body to maintain planarization quality while the projection handles the separation function, reducing defects.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The projection acts as an intermediary element between the superstrate body and the substrate. It provides a dedicated interface for separation, mediating the interaction between the superstrate and dispense material to prevent direct adhesion issues between the main superstrate body and the substrate.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Productivity

If the superstrate covers the entire wafer for whole wafer processing, then processing efficiency is improved, but separation control becomes more difficult

Engineering Contradiction:
Improveprocessing efficiencyVSAvoidseparation control
Core Design Contradiction:
ProductivityVSEase of operation

Solution Approach 1:

The superstrate design segments the separation function into a distinct projection element, making it easier to control separation across the entire wafer surface. The projection provides a localized interface that simplifies the separation operation while maintaining whole wafer coverage for high productivity.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The projection is designed to facilitate self-service separation, where the geometry of the projection (extending into the open area) allows for automatic or simplified separation initiation. This reduces the complexity of separation control operations while maintaining efficient whole wafer processing.

Inventive Principle:
Principle #25Self-service

3Ease of operation

If projections are added to the superstrate for separation enhancement, then separation effectiveness is improved, but device complexity increases

Engineering Contradiction:
Improveseparation effectivenessVSAvoidsuperstrate structural complexity
Core Design Contradiction:
Ease of operationVSDevice complexity

Solution Approach 1:

The superstrate is divided into functional segments: a body portion for planarization and a projection portion for separation. This minimal segmentation adds only the necessary complexity for effective separation without over-complicating the overall device structure.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The projection provides localized functionality for separation enhancement at specific regions (where the open area is located), while the rest of the superstrate body maintains its simple planarization function. This local quality approach enhances separation effectiveness without requiring complex modifications across the entire device.

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The superstrate design enables effective planarization and separation, reducing defects and enabling whole wafer processing without the need for specialized equipment, thus improving manufacturing efficiency and cost-effectiveness.

Implementation Method 1

separating the superstrate and the substrate may be by applying a force on the first projection to enhance a crack propagation between the mesa and the substrate

Methodology Applied
Scientific EffectCrack propagation: Fracture Mechanics

Data Source

PatentUS11018018B2Superstrate and methods of using the same
Publication Date: 2021.05.25 CANON KK
  • US11018018B2 patent drawing
  • US11018018B2 patent drawing
  • US11018018B2 patent drawing

AI summary

An apparatus may include a superstrate. The superstrate can include a body having a diameter. The body may fit within a projected square. The projected square may have a length equal to the diameter of the body. The body within the projected square may produce an open area between an exterior edge of the body and the projected square. The superstrate may further include a first projection extending from the exterior edge of the body within the open area.