Suppression Electrode Distal Edge Heating for Ion Beam Uniformity

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Solution Overview

Problem

The uneven heating of suppression electrodes in ion source systems leads to thermal distortion, affecting the uniformity of the ion beam, particularly as the length of the suppression electrode increases, causing irregularities in the ion beam's shape and current distribution.

Innovation Solution

An apparatus with a heating element to control the temperature of the distal edge of the suppression electrode, using thermal sensors and a controller to monitor and adjust the heat applied, ensuring uniform ion beam distribution by compensating for thermal expansion and distortion.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If the suppression electrode is made longer to improve ion beam suppression, then the ion beam uniformity deteriorates due to increased thermal distortion

Engineering Contradiction:
Improveion beam suppressionVSAvoidion beam uniformity
Core Design Contradiction:
ReliabilityVSManufacturing precision

Solution Approach 1:

The patent applies parameter changes by heating the distal edge of the suppression electrode to a controlled temperature, thereby changing the thermal state of the electrode to compensate for thermal distortion caused by ion beam extraction, maintaining optical edge position and ion beam uniformity

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent implements preliminary anti-action by pre-heating the distal edge of the suppression electrode before ion beam extraction to counteract the upcoming thermal distortion, creating a thermal gradient that offsets the distortion that would otherwise occur during operation

Inventive Principle:
Principle #9Preliminary anti-action

2Manufacturing precision

If the suppression electrode is heated unevenly by the ion beam, then the optical edge distorts, but adding heating elements increases device complexity

Engineering Contradiction:
Improveoptical edge positionVSAvoidheating control system
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent applies local quality by heating only the distal edge of the suppression electrode rather than the entire electrode, creating a localized thermal gradient that compensates for distortion at the critical optical edge region while minimizing overall system complexity

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The patent implements feedback control by monitoring the position of the optical edge and adjusting the heating power to the distal edge accordingly, maintaining the optical edge at the desired position through closed-loop control

Inventive Principle:
Principle #23Feedback

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution significantly reduces thermal distortion by over 85%, improving the uniformity of the ion beam and providing a mechanism to fine-tune ion beam profiles, enhancing the precision and efficiency of semiconductor processes.

Implementation Method 1

the suppression electrode may be heated unevenly by these extracted ions... the uneven heating of the suppression electrode may be problematic... thermal distortion of the suppression electrode

Methodology Applied
Scientific EffectThermal expansion: Thermal Expansion

Implementation Method 2

thermal sensors in communication with the controller to measure a temperature of at least a portion of the suppression electrode

Methodology Applied
Scientific EffectThermal radiation: Thermal Radiation

Data Source

PatentUS10062544B2Apparatus and method for minimizing thermal distortion in electrodes used with ion sources
Publication Date: 2018.08.28 VARIAN SEMICON EQUIP ASSC INC
  • US10062544B2 patent drawing
  • US10062544B2 patent drawing
  • US10062544B2 patent drawing

AI summary

An apparatus for improving the uniformity of an ion beam is disclosed. The apparatus includes a heating element to heat an edge of the suppression electrode that is located furthest from the suppression aperture. In operation, the edge of the suppression electrode nearest to the suppression electrode may be heated by the ion beam. This heat may cause the suppression electrode to distort, affecting the uniformity of the ion beam. By heating the distal edge of the suppression electrode, the thermal distortion of the suppression electrode can be controlled. In other embodiments, the distal edge of the suppression electrode is heated to create a more uniform ion beam. By monitoring the uniformity of the ion beam downstream from the suppression electrode, such as by use of a beam uniformity profiler, a controller can adjust the heat applied to the distal edge to achieve the desired ion beam uniformity.