Susceptor-Rotating Tube Alignment for Uniform Substrate Heating
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Solution Overview
Problem
In MOCVD processes, the non-concentric and asynchronous rotation of the susceptor and rotating tube due to horizontal relative movement leads to uneven heating of the susceptor, affecting the uniformity of substrate surface temperature and potentially damaging the rotating tube.
Innovation Solution
A substrate supporting device is introduced, featuring a susceptor with a first limiting portion and a rotating tube with a second limiting portion, which cooperate to limit horizontal relative movement between the susceptor and rotating tube during rotation, ensuring synchronous and concentric rotation and uniform heating.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a gap is formed between the susceptor and rotating tube to avoid thermal expansion damage and reduce heat loss, then the rotating tube is protected from breaking and heat loss is reduced, but horizontal relative movement occurs during rotation causing non-concentric and asynchronous rotation
Solution Approach 1:
A limiting portion structure is introduced as an intermediary mechanism between the susceptor and rotating tube. This limiting portion restricts horizontal relative movement while allowing the gap to remain open for thermal expansion and heat loss reduction, thereby maintaining both reliability and rotation precision
Solution Approach 2:
The horizontal position parameter of the susceptor relative to the rotating tube is constrained by the limiting portion. This parameter control ensures that during rotation, the horizontal displacement remains within acceptable limits, maintaining concentric rotation while preserving the beneficial gap
2Loss of energy
If the susceptor and rotating tube rotate non-concentrically and asynchronously due to horizontal relative movement, then the gap structure is maintained, but uneven heating of the susceptor occurs affecting substrate temperature uniformity
Solution Approach 1:
The limiting portion acts as a mediator that prevents excessive horizontal movement between susceptor and rotating tube. This ensures synchronous rotation and concentric alignment, which are critical for uniform heat distribution across the substrate while maintaining the gap for heat loss reduction
3Difficulty of detecting and measuring
If the susceptor and rotating tube are allowed to move relative to each other horizontally, then the gap structure provides thermal expansion clearance, but the rotating tube may be damaged
Solution Approach 1:
The limiting portion serves as a protective intermediary that allows controlled movement for thermal expansion while preventing uncontrolled movement that could damage the rotating tube. It mediates between the need for expansion clearance and the need for structural integrity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution achieves uniform heating of the susceptor and ensures the uniformity of substrate surface temperature, while also preventing process gas from entering the rotating tube and stray light from interfering with temperature measurements.
Implementation Method 1
a heating lamp is located below the susceptor and within an area enclosed by the rotating tube, to provide thermal energy to the susceptor and transfer the thermal energy to the substrate
Implementation Method 2
A uniform heat conducting portion is arranged in the central area of the bottom surface of the susceptor and is configured to uniformly transfer heat radiated by a heater below the susceptor to the substrate placed on the susceptor
Implementation Method 3
The rotation of the susceptor is achieved by driving the rotating tube to rotate about its central axis (through the friction between the rotating tube and the susceptor)
Data Source
AI summary
Provided is a substrate supporting device, including a susceptor and a rotating tube. The susceptor is arranged in the process chamber of a substrate processing apparatus for supporting the substrate; the bottom surface of the susceptor is provided with a first limiting portion; the rotating tube, having a cylindrical structure, is arranged below the susceptor and supports the susceptor, the side wall of the rotating tube is provided with a second limiting portion corresponding to the first limiting portion in position, and relative movement between the rotating tube and the susceptor in the horizontal direction is limited when the two rotate through cooperation of the first limiting portion and the corresponding second limiting portion. The present invention also provides a substrate processing apparatus. According to the present invention, synchronous rotation of the susceptor and the rotating tube can be ensured, thereby enabling the susceptor to be uniformly heated, and ensuring uniformity of substrate surface temperature.