Thin Film Transistor Substrate Light Transmittance Optimization
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Solution Overview
Problem
Conventional thin film transistor substrates have reduced light transmittance due to the presence of insulating layers in the pixel area, which affects the display performance in liquid crystal display apparatuses.
Innovation Solution
The design excludes the first insulating layer from the pixel area and uses a specific configuration of sub-insulating layers, including silicon nitride and silicon oxide, to improve light transmittance by optimizing the structure of the thin film transistor substrate, specifically by removing the first insulating layer from the pixel area and using a particular arrangement of sub-insulating layers to enhance transparency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Illumination intensity
If insulating layers are present in the pixel area, then the thin film transistor structure is complete and functional, but light transmittance is reduced
Solution Approach 1:
The insulating layer structure is segmented into multiple sub-layers (first sub-insulating layer, second sub-insulating layer, third sub-insulating layer, fourth sub-insulating layer) with different materials and positions. This segmentation allows optimization of light transmittance in the pixel area while maintaining necessary insulation functionality through strategic placement of each sub-layer.
Solution Approach 2:
Different regions of the substrate are assigned different insulating layer configurations. The pixel area has reduced insulating layer presence or optimized material composition for high light transmittance, while the non-pixel area maintains complete insulating coverage for proper transistor isolation and functionality.
2Reliability
If multiple insulating layers are used to ensure proper transistor isolation, then device reliability is improved, but device complexity increases
Solution Approach 1:
Multiple insulating functions are merged into an integrated multi-layer structure where sub-insulating layers serve both isolation and light management functions. The first and second sub-insulating layers provide gate region isolation, while the third and fourth sub-insulating layers provide source-drain region isolation, combining multiple functions into a unified structure.
Solution Approach 2:
The insulating structure uses composite material composition with different dielectric materials for different sub-layers. This allows optimization of both electrical isolation properties and optical properties (light transmittance) through material selection, reducing the need for additional layers.
Data Source
AI summary
Each pixel of a thin film transistor substrate includes a base substrate including a pixel display area and a pixel non-display area surrounding the pixel display area, a gate electrode on the base substrate in the pixel non-display area, a first insulating layer which is on the base substrate in the pixel non-display area and covers the gate electrode, a semiconductor layer on the first insulating layer, of which a predetermined portion thereof overlaps the gate electrode, a source electrode and a drain electrode which are spaced apart from each other and on the semiconductor layer, a second insulating layer which is on the first insulating layer and the base substrate and covers the source electrode and the drain electrode, and a pixel electrode on the second insulating layer in the pixel display area.