Thin Film Transistor Contact Regions with Variable Thickness

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Solution Overview

Problem

High contact resistance between the active layer and source/drain electrodes in thin film transistors (TFTs) degrades their performance, particularly in display devices like OLEDs and LCDs, by reducing power generation and efficiency.

Innovation Solution

A thin film transistor design with contact regions thinner than the remaining active layer regions, using an oxide semiconductor and an interface stabilizing layer with a band gap equal to or greater than the active layer, and an etch stop layer to reduce contact resistance, along with a method of fabricating the TFTs using a half-tone mask and over etching process.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If the active layer is made uniformly thick, then the structural simplicity is maintained, but the contact resistance between source/drain electrodes and active layer increases

Engineering Contradiction:
Improvecontact resistanceVSAvoidactive layer structure
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The active layer is designed with different thicknesses in different regions: a first thickness in the channel region and a second thickness (greater than the first) in the contact regions. This local variation in thickness reduces contact resistance at the source/drain electrodes while maintaining the necessary channel properties, directly resolving the contradiction between contact resistance and structural simplicity.

Inventive Principle:
Principle #3Local quality

2Reliability

If additional crystallization processes are introduced to improve electrical characteristics, then the TFT performance improves, but the manufacturing process complexity and time increase

Engineering Contradiction:
Improveelectrical characteristicsVSAvoidmanufacturing process efficiency
Core Design Contradiction:
ReliabilityVSProductivity

Solution Approach 1:

The invention changes the physical parameter of the active layer from uniform thickness to non-uniform thickness with thicker contact regions. This parameter change improves electrical characteristics and reduces contact resistance without requiring additional crystallization processes, thereby maintaining high productivity while improving reliability.

Inventive Principle:
Principle #35Parameter changes

Data Source

PatentUS8466462B2Thin film transistor and method of fabricating the same
Publication Date: 2013.06.18 SAMSUNG DISPLAY CO LTD
  • US8466462B2 patent drawing
  • US8466462B2 patent drawing
  • US8466462B2 patent drawing

AI summary

A thin film transistor (TFT) including a gate electrode, an active layer, and source and drain electrodes. The active layer includes contact regions that contact the source and drain electrodes, which are thinner than a remaining region of the active layer. The contact regions reduce the contact resistance between the active material layer and the source and drain electrodes.