Titanium Etchant Composition for Cost-Effective Wet Processing
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Solution Overview
Problem
The high production cost of organic light emitting diode (OLED) display panels is due to the high cost of dry etching processes, which are required for etching multiple metal films, particularly titanium and titanium alloy films, as existing etchant compositions are inadequate for controlling etching rates and line width specifications.
Innovation Solution
A wet etchant composition comprising hydrofluoric acid, a co-oxidant such as nitric and perchloric acid, an alkali metal salt like sodium nitrate, and deionized water, which forms a dense oxide film and inhibits titanium ion aggregation, allowing for efficient etching of titanium and aluminum films without the need for dry etching.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If wet etching is used for etching titanium and aluminum films, then equipment cost and operating cost are reduced, but etching rate control and line width specification are difficult to achieve
Solution Approach 1:
The patent modifies the chemical composition parameters of the etchant solution by incorporating specific ratios of hydrofluoric acid (0.5-3%), nitric acid (1-5%), and perchloric acid (30-50%), along with alkali metal salts (1-5%). These parameter adjustments enable the etchant to achieve both cost-effectiveness and precise control over etching rates and line width specifications, resolving the contradiction between lower equipment cost and manufacturing precision.
2Manufacturing precision
If dry etching is used for simultaneous etching of multiple metal films, then etching precision is improved, but equipment cost and operating cost increase
Solution Approach 1:
The patent replaces the mechanical/physical dry etching process with a chemical wet etching process. The developed etchant composition using hydrofluoric acid, nitric acid, and perchloric acid creates a chemical reaction-based etching method that achieves comparable or superior etching precision while eliminating the need for expensive dry etching equipment, thus reducing both equipment cost and operating cost.
3Ease of operation
If conventional etchants are used for etching titanium films, then etching process is simple, but etching rate is difficult to control and line width specification cannot be met
Solution Approach 1:
The patent creates a composite etchant system by combining multiple chemicals in specific proportions: hydrofluoric acid (0.5-3%), nitric acid (1-5%), and perchloric acid (30-50%), along with alkali metal salts (1-5%). This composite formulation provides both process simplicity and precise control over etching rates and line width specifications, as the synergistic interaction of multiple components enables fine-tuned etching behavior.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition enables cost-effective wet etching of multilayer metal films, reducing equipment and operating costs while maintaining etching efficiency and uniformity, thereby improving production efficiency and reducing the need for expensive dry etching equipment.
Implementation Method 1
hydrofluoric acid as a primary oxidant, a co-oxidant that forms a dense oxide film on a surface of a titanium film during an etching process
Implementation Method 2
an alkali metal salt that inhibits aggregation and adsorption of titanium ions during the etching process
Data Source
AI summary
An etchant composition for wet etching a titanium-containing film. The etchant composition includes hydrofluoric acid as a primary oxidant, a co-oxidant that forms a dense oxide film on a surface of a titanium film during an etching process, an alkali metal salt that inhibits aggregation and adsorption of titanium ions during the etching process, and a solvent.