Transfer Blade Contact Layout for Defect-Safe Workpiece Handling
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Solution Overview
Problem
Conventional workpiece carriers in semiconductor manufacturing, such as transfer blades, face limitations in speed due to inertial forces and damage from debris that cause defects such as scratches and indentations on the surface of the workpiece, which are not addressed by existing vacuum and electrostatic retention methods, leading to defects in sensitive areas like EUV frames.
Innovation Solution
The transfer blade design includes recessed surfaces that do not contact the workpiece's sensitive areas, combined with hooks to prevent movement and vacuum retention, reducing contact-induced defects by maintaining the workpiece's position without direct surface contact.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the transfer blade uses direct contact surfaces to support the workpiece, then the workpiece can be securely held during transfer, but defects such as scratches and indentations occur on the workpiece surface
Solution Approach 1:
The transfer blade is divided into distinct functional zones: raised contact regions for secure gripping and recessed non-contact regions for avoiding sensitive areas. This segmentation allows the blade to simultaneously achieve reliable workpiece holding while preventing surface defects by spatially separating contact and non-contact functions.
Solution Approach 2:
Different regions of the transfer blade have different geometric properties - raised surfaces in contact regions provide secure gripping, while recessed surfaces in non-contact regions prevent damage to sensitive workpiece areas. This local differentiation of geometric quality enables the blade to perform multiple functions with a single structure.
2Productivity
If the critical region size on the workpiece is increased, then more semiconductor devices can be processed per wafer, but the likelihood of defects increases due to direct contact with the transfer blade
Solution Approach 1:
The transfer blade design adds a vertical dimension to the contact geometry by creating raised and recessed regions. This dimensional change allows critical regions to be enlarged on the workpiece surface without increasing the probability of defects, as the recessed regions provide clearance that prevents contact-related damage even when critical regions occupy more of the wafer surface.
3Productivity
If the transfer blade speed is increased to improve productivity, then manufacturing efficiency increases, but inertial forces cause the workpiece to shift position
Solution Approach 1:
The transfer blade design incorporates dynamic considerations through its raised and recessed geometry that optimizes the distribution of contact forces. This dynamic optimization allows higher transfer speeds while maintaining workpiece position accuracy, as the raised contact regions provide secure gripping that counteracts inertial forces during acceleration and deceleration.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design minimizes defects on sensitive workpiece surfaces, ensuring higher manufacturing precision and reducing defects in semiconductor devices by avoiding contact with critical regions.
Implementation Method 1
the robot blade utilizes the vacuum source to maintain the position of the workpiece relative to the robot blade. For example, the vacuum source is plumbed to the robot blade in order to selectively provide a vacuum to an interface between the workpiece and the robot blade
Implementation Method 2
Typically, gravity maintains the position of the workpiece with respect to the robot blade
Implementation Method 3
electrostatic forces are used to attract a workpiece to a workpiece retaining surface of a robot blade
Data Source
AI summary
Z The present disclosure is directed to a transfer blade including a first end segment, a second end segment opposite to the first end segment, and an intermediate segment extending from the first end segment to the second end segment. The first end segment includes a first contact region and the second end segment includes a second contact region. The first and second contact regions are configured to contact locations of a surface of a workpiece that do not overlap or are not aligned with a sensitive area of the workpiece. The sensitive area of the workpiece may be an EUV frame or a reticle of the workpiece. A non-contact region extends continuously along the first end segment, the intermediate segment, and the second end segment, and the non-contact region overlaps the sensitive area of the workpiece and is spaced apart from the sensitive area of the workpiece.


