Transflective LCD Panel Metal Bump Reflective Layer
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Solution Overview
Problem
The manufacturing process of conventional transflective LCD panels is complicated and costly due to the need for an organic insulating layer that increases process time and creates height differences between reflection and transmission regions, leading to difficulties in process control and potential open line faults in pixel electrodes.
Innovation Solution
A method involving the formation of metal bumps on the array substrate to create a rough surface for the reflective layer without an extra photomask, allowing for simultaneous patterning of gate electrodes, semiconductor layers, and pixel electrodes, which simplifies the process and reduces costs by eliminating the need for additional photomasks and minimizing height differences between regions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If an organic insulating layer is formed to raise the reflection region to match optical path lengths, then the optical path length equality is improved, but the process time and process cost increase
Solution Approach 1:
The patent removes the organic insulating layer from the manufacturing process entirely. Instead of adding this layer to raise the reflection region, the invention uses the native planar structure of the array substrate, eliminating the need for this additional processing step while still achieving the required optical path length equality through alternative means.
Solution Approach 2:
Rather than raising the reflection region by adding material (organic insulating layer), the patent inverts the approach by keeping the substrate planar and instead modifying how the reflective and transmissive regions are configured to achieve optical path length equality without additional layers.
2Manufacturing precision
If an organic insulating layer is formed to raise the reflection region, then the optical path length equality is improved, but the process cost increases
Solution Approach 1:
The patent eliminates the organic insulating layer and the photomask step required to pattern it, directly reducing material costs and process complexity. The invention achieves optical path length equality through the configuration of the reflective layer and pixel electrode structure rather than through additional insulating layers.
Solution Approach 2:
The patent applies different properties to different regions: the reflection region uses a reflective layer with specific optical properties, while the transmission region maintains transparency. This localized differentiation achieves the required optical path length equality without requiring a universal organic insulating layer across the entire substrate.
3Measurement precision
If the organic insulating layer is thickened to half of the cell gap to define position and profile, then the positioning precision is improved, but the device complexity increases
Solution Approach 1:
The patent removes the thick organic insulating layer and its associated photomask patterning step. Positioning precision is achieved instead through the direct patterning of the reflective layer and pixel electrode on the planar substrate, eliminating the need for the complex multi-layer structure.
Solution Approach 2:
The patent performs the positioning function during the standard TFT fabrication process itself, rather than requiring a separate preparatory layer. The reflective layer is positioned and patterned as part of the normal manufacturing sequence, integrating the positioning function into existing process steps.
4Illumination intensity
If a photomask is used to form a predetermined pattern in the organic insulating layer to improve reflectivity, then the reflectivity is improved, but the fabrication complexity increases
Solution Approach 1:
The patent eliminates the photomask step entirely by forming the reflective layer directly on the planar substrate without requiring a pre-patterned organic insulating layer. The reflective properties are achieved through the material properties and geometric configuration of the reflective layer itself, not through photomask-defined patterns.
Solution Approach 2:
The patent combines the reflective layer formation with the standard TFT fabrication process, integrating multiple functions into a single process step. The reflective layer serves both as the optical reflective element and as part of the electrical structure, eliminating the need for separate patterning steps.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach simplifies the manufacturing process, reduces costs, and avoids open line faults in pixel electrodes by ensuring coplanar arrangement of reflection, device, and transmission regions, thereby enhancing process control and reflectivity.
Implementation Method 1
forming a reflective layer in the reflection region, the reflective layer covering the first insulating layer and having a rough surface thereby
Data Source
AI summary
A method for manufacturing a transflective liquid crystal display panel includes providing an array substrate having a plurality of pixel regions, each of the pixel regions includes a device region, a transmission region and a reflection region defined therein; forming a first metal layer on the array substrate; patterning the first metal layer to simultaneously form a gate electrode in the device region and a plurality of metal bumps in the reflection region; forming a first insulating layer having a rough surface and covering the gate electrode and the metal bumps on the array substrate; forming a patterned semiconductor layer on the gate electrode; forming a reflective layer covering the first insulating layer and having a rough surface in the reflection region; and sequentially forming a patterned second insulating layer and a transparent pixel electrode on the array substrate.