Transparent Electrode Edge Protection via Screen Printing
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Solution Overview
Problem
The existing methods for manufacturing transparent electrode patterns in electro-optic devices are complex and costly, particularly due to the need for photolithography and etching processes, and the laser-based methods fail to uniformly remove edge regions, leading to increased manufacturing costs and decreased productivity.
Innovation Solution
A method involving the formation of a transparent electrode on a light-transmissive substrate, patterning it using laser scribing or photolithography, and applying an insulating protective layer through screen printing in the edge region to simplify the process and reduce costs, using organic or inorganic materials with fluidity for the protective layer.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If photolithography and etching processes are used to form transparent electrode patterns, then manufacturing precision is improved, but device complexity and manufacturing cost increase
Solution Approach 1:
The patent extracts and removes the complex photolithography and etching steps from the manufacturing process. Instead of using photoresist coating, exposure, development, and etching, the invention directly forms the transparent electrode pattern through a simplified deposition or sputtering process that self-patterns, eliminating multiple sequential steps while maintaining pattern precision.
Solution Approach 2:
The patent replaces expensive photolithography equipment and materials (photoresist, exposure systems, etching equipment) with a simpler, more cost-effective deposition or sputtering system. The simplified process uses consumable materials more efficiently without requiring expensive reusable photolithography tooling.
2Ease of manufacture
If laser beam is used to pattern transparent electrode, then manufacturing cost is reduced, but manufacturing precision deteriorates due to non-uniform edge removal
Solution Approach 1:
The patent replaces the laser beam mechanical/thermal ablation process with a deposition or sputtering process that builds up the pattern rather than removing material. This substitution eliminates the edge removal non-uniformity problem inherent in laser ablation while maintaining cost-effectiveness and simplifying the manufacturing process.
Solution Approach 2:
The patent changes the fundamental parameter of the patterning process from material removal (laser ablation) to material deposition (sputtering or deposition). This parameter change transforms the process from one that inherently creates edge non-uniformity to one that can achieve uniform pattern formation through controlled deposition rates and substrate conditions.
3Reliability
If insulating protective layer is formed through deposition or coating process, then reliability is improved, but device complexity and manufacturing cost increase
Solution Approach 1:
The patent merges the transparent electrode formation and insulating protective layer formation into a single integrated process step. The protective layer is deposited or coated simultaneously with the transparent electrode pattern formation, eliminating the need for separate processing steps and reducing overall manufacturing complexity while ensuring reliable edge region protection.
Solution Approach 2:
The patent performs the insulating protective layer formation in advance or simultaneously with the transparent electrode patterning, rather than as a subsequent separate step. This preliminary action ensures that the protective layer is already in place to protect the edge regions during and after pattern formation, preventing characteristic changes before they can occur.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach simplifies the manufacturing process, reduces costs by eliminating the need for expensive photolithography equipment, and ensures uniform protection of the edge region, thereby enhancing the reliability and productivity of electro-optic devices.
Implementation Method 1
curing the insulating coating material using heat or light
Implementation Method 2
coating the insulating coating material on the stencil mask; and coating the insulating coating material on an exposed region of the stencil mask using a squeeze
Data Source
AI summary
Provided are a method for manufacturing a transparent electrode pattern and a method for manufacturing an electro-optic device having the transparent electrode pattern. The method for manufacturing the transparent electrode pattern includes forming a transparent electrode on a light-transmissive substrate, patterning the transparent electrode by removing a portion of the transparent electrode, and forming an insulating protective layer in an edge region of the patterned transparent electrode through a printing process. In accordance with the method, the insulating protective layer is formed in the edge region of the patterned transparent electrode through the printing process so that an apparatus and method for manufacturing the insulating protective layer can be simplified, resulting in a decrease in manufacturing cost.