Transparent Line Integration in Display Substrates for Under-Screen Cameras

The patent merges the transparent conductive line layer with the existing insulating layers in the pixel circuit structure. Specifically, the transparent conductive lines are integrated within the multi-layer insulating structure (including planarization layers and interlayer dielectric layers), allowing the conductive traces to be formed as part of the existing fabrication process rather than as separate additional layers. This integration reduces structural complexity while maintaining the necessary electrical connections for the under-screen camera display region.

The insulating layers in the pixel circuit are designed to serve multiple functions: electrical insulation between conductive elements, mechanical planarization for subsequent layer deposition, and structural support for the transparent conductive lines. By making the insulating layers multi-functional, the patent eliminates the need for separate dedicated transparent conductive trace layers, thereby reducing overall structural complexity while maintaining display functionality.

The transparent conductive lines are combined with the existing insulating layer fabrication process. The same sputtering, evaporation, or chemical vapor deposition equipment used for creating insulating layers is also used to deposit the transparent conductive materials (such as ITO or IGZO). This merging of process steps eliminates the need for additional dedicated manufacturing equipment and process optimization, thereby reducing manufacturing costs while achieving the required display functionality.

The insulating layers are designed to perform multiple roles including electrical insulation, mechanical planarization, and structural support for transparent conductive lines. This multi-functionality reduces the total number of manufacturing steps required, as single process steps achieve multiple objectives. Fewer process steps directly translate to lower manufacturing costs while maintaining the necessary display performance.

The transparent conductive lines are positioned only in specific locations where electrical connections are required, rather than forming continuous traces across the entire light-transmitting display region. The lines are localized to connect specific pixel circuit elements (such as from the emission control electrode to the anode, or from gate electrodes to data lines) while leaving the majority of the light-transmitting area free of conductive materials. This localized approach minimizes light obstruction while maintaining necessary electrical connectivity.

The patent employs extremely thin transparent conductive film layers (typically nanometer-scale thickness) that provide sufficient electrical conductivity for signal transmission while being sufficiently transparent to allow light passage. The thin film nature of these conductive layers, combined with their optimized material composition (such as ITO or IGZO with controlled stoichiometry), enables them to function as both electrical conductors and optical transparent elements, thus maintaining display functionality while preserving light transmittance.