Transparent Metal Mesh via Rolling Mask Lithography
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Solution Overview
Problem
Roll-to-roll and roll-to-plate lithography methods using cylindrical masks often result in undesirable seam lines due to lamination issues, leading to imperfect pattern transfer and the need for seamless, smooth polymer layers for advanced nanoscale fabrication.
Innovation Solution
The use of rolling mask lithography (RML) with a rotating transparent cylinder and radiation-sensitive materials to create metal mesh structures with submicron linewidths, employing techniques like metal etching and lift-off to produce seamless patterns on large substrates, avoiding vacuum processes and enabling smooth, uniform metal mesh fabrication.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If lamination of polymer layer on cylindrical mask is used, then pattern transfer capability is achieved, but seam lines are created at the edges
Solution Approach 1:
The cylindrical mask is divided into multiple segments or zones, with the polymer layer applied in a manner that avoids continuous wrapping around the cylinder. This segmentation prevents the formation of seam lines where edges would meet, while still allowing the mask to transfer patterns effectively to the substrate.
2Manufacturing precision
If polymer layer is made thick and uniform for smooth surface, then surface quality improves, but manufacturing complexity increases
Solution Approach 1:
The patent replaces complex mechanical lamination processes with a more straightforward polymer deposition or coating method. This substitution simplifies the fabrication process while achieving the desired thick, uniform polymer layer with smooth surface quality, avoiding the need for precise mechanical alignment and pressing operations.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
RML allows for the production of seamless metal mesh structures with submicron features on large, flexible substrates, achieving high transparency and low sheet resistance, suitable for applications like OLEDs and touch screens, while reducing manufacturing costs and avoiding the need for additional smoothing layers.
Implementation Method 1
radiation transmitted through a rotating mask to generate a nanopattern in a layer of radiation-sensitive material on a substrate
Data Source
AI summary
Embodiments of the present disclosure include a metal mesh structure and a method of fabrication thereof. The metal mesh structure includes a metal mesh formed on a substrate. The metal mesh is a 2D or 3D pattern of lines. The lines in the first and second set are characterized by a linewidth that is less than 2 microns. Such metal mesh structures are fabricated through rolling mask lithography. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.